Base contacts and selective emitters processed by laser doping technique for p-type IBC c-Si solar cells

Abstract In this work, we describe a novel fabrication process of p-type interdigitated back contact (IBC) silicon solar developed by means of laser doping and laser firing techniques. We use dielectric layers both as dopant sources to create highly-doped regions and as passivating layers. In partic...

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Detalles Bibliográficos
Autores: López Rodríguez, Gema|||0000-0003-4806-5180, Ortega Villasclaras, Pablo Rafael|||0000-0001-6577-614X, Martín García, Isidro|||0000-0001-8833-9057, Voz Sánchez, Cristóbal|||0000-0002-0320-9606, Morales Vilches, Ana Belén, Orpella García, Alberto|||0000-0003-2726-5861, Alcubilla González, Ramón|||0000-0003-4827-4513
Tipo de recurso: artículo
Fecha de publicación:2015
País:España
Institución:Universitat Politècnica de Catalunya (UPC)
Repositorio:UPCommons. Portal del coneixement obert de la UPC
Idioma:inglés
OAI Identifier:oai:upcommons.upc.edu:2117/84884
Acceso en línea:https://hdl.handle.net/2117/84884
https://dx.doi.org/10.1016/j.egypro.2015.07.106
Access Level:acceso abierto
Palabra clave:Solar cells
IBC-BJ
Laser doping
selective emitter
c-Si solar cells
Cèl·lules solars
Bateries solars
Àrees temàtiques de la UPC::Energies::Energia solar fotovoltaica::Cèl·lules solars
Àrees temàtiques de la UPC::Enginyeria electrònica::Optoelectrònica::Làser
Descripción
Sumario:Abstract In this work, we describe a novel fabrication process of p-type interdigitated back contact (IBC) silicon solar developed by means of laser doping and laser firing techniques. We use dielectric layers both as dopant sources to create highly-doped regions and as passivating layers. In particular, we use phosphorus-doped silicon carbide stacks (a-SiCx (n)) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and aluminum oxide (Al2O3) layer deposited by atomic layer deposition (ALD). Emitters were fabricated with a light thermal phosphorus diffusion in order to reduce bulk and surface emitter recombination losses. Highly doped regions n++ (emitter) and p++ (base) were simultaneously created in a point-like structure using a pulsed Nd-YAG 1064 nm laser in the nanosecond regime by laser processing the dielectric layers. The results obtained for a cell, 3x3 cm2, are presented. Efficiencies up to 18.1% (Jsc = 39 mA/cm2, Voc = 632 mV, FF = 73.4%) have been achieved in our fabricated IBC cells.