XANES and EXAFS study of the TiN Thin films grown by the pulsed DC sputtering technique assisted by balanced magnetron

A series of different TixNy thin films were grown by the DC-sputtering technique. The purpose for this work was to study through XAS interpretation, how the different amounts of N2 during growing thin TiN thin films, affects the stoichiometry of the TiN deposited. Also the results obtained determina...

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Detalhes bibliográficos
Autor: JOSE ALBERTO DUARTE MOLLER
Tipo de documento: artigo
Estado:Versión enviada para evaluación y publicación
Data de publicação:2007
País:México
Recursos:Centro de Investigación en Materiales Avanzados
Repositório:Fuente de Objetos Científicos Open Access del CIMAV
Idioma:inglês
OAI Identifier:oai:cimav.repositorioinstitucional.mx:1004/967
Acesso em linha:http://cimav.repositorioinstitucional.mx/jspui/handle/1004/967
Access Level:Acceso aberto
Palavra-chave:info:eu-repo/classification/Nituration/TiN
info:eu-repo/classification/PLD/Thin films
info:eu-repo/classification/cti/1
info:eu-repo/classification/cti/22
info:eu-repo/classification/cti/2299
info:eu-repo/classification/cti/229999
Descrição
Resumo:A series of different TixNy thin films were grown by the DC-sputtering technique. The purpose for this work was to study through XAS interpretation, how the different amounts of N2 during growing thin TiN thin films, affects the stoichiometry of the TiN deposited. Also the results obtained determinate how to interpret the spectra to see the different valences of Ti in TiN, are working. The results were supported with the EXAFS and XANES analysis. This work concludes the adequated conditions for this experiment to obtain TiN as thin film by the DC sputtering assited by pulsed balanced magnetron at room temperature and aconcludes which XANES spectra are the finger print for valences of Ti