XANES and EXAFS study of the TiN Thin films grown by the pulsed DC sputtering technique assisted by balanced magnetron

A series of different TixNy thin films were grown by the DC-sputtering technique. The purpose for this work was to study through XAS interpretation, how the different amounts of N2 during growing thin TiN thin films, affects the stoichiometry of the TiN deposited. Also the results obtained determina...

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Detalles Bibliográficos
Autor: JOSE ALBERTO DUARTE MOLLER
Tipo de recurso: artículo
Estado:Versión enviada para evaluación y publicación
Fecha de publicación:2007
País:México
Institución:Centro de Investigación en Materiales Avanzados
Repositorio:Fuente de Objetos Científicos Open Access del CIMAV
Idioma:inglés
OAI Identifier:oai:cimav.repositorioinstitucional.mx:1004/967
Acceso en línea:http://cimav.repositorioinstitucional.mx/jspui/handle/1004/967
Access Level:acceso abierto
Palabra clave:info:eu-repo/classification/Nituration/TiN
info:eu-repo/classification/PLD/Thin films
info:eu-repo/classification/cti/1
info:eu-repo/classification/cti/22
info:eu-repo/classification/cti/2299
info:eu-repo/classification/cti/229999
Descripción
Sumario:A series of different TixNy thin films were grown by the DC-sputtering technique. The purpose for this work was to study through XAS interpretation, how the different amounts of N2 during growing thin TiN thin films, affects the stoichiometry of the TiN deposited. Also the results obtained determinate how to interpret the spectra to see the different valences of Ti in TiN, are working. The results were supported with the EXAFS and XANES analysis. This work concludes the adequated conditions for this experiment to obtain TiN as thin film by the DC sputtering assited by pulsed balanced magnetron at room temperature and aconcludes which XANES spectra are the finger print for valences of Ti