Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films

Producción Científica

Detalles Bibliográficos
Autores: Kalam, Kristjan, Seemen, Helina, Mikkor, Mats, Ritslaid, Peeter, Stern, Raivo, Dueñas Carazo, Salvador, Castán Lanaspa, María Helena, Tamm, Aile, Kukli, Kaupo
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2018
País:España
Institución:Universidad de Valladolid
Repositorio:UVaDOC. Repositorio Documental de la Universidad de Valladolid
OAI Identifier:oai:uvadoc.uva.es:10324/44663
Acceso en línea:https://doi.org/10.1149/2.0041809jss
http://uvadoc.uva.es/handle/10324/44663
Access Level:acceso abierto
Palabra clave:Thin films
Láminas delgadas
Atomic layer deposition
Deposición atómica de capas
id ES_ee37e4965aba04a6526d46e8d5e48dbf
oai_identifier_str oai:uvadoc.uva.es:10324/44663
network_acronym_str ES
network_name_str España
repository_id_str
spelling Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin filmsKalam, KristjanSeemen, HelinaMikkor, MatsRitslaid, PeeterStern, RaivoDueñas Carazo, SalvadorCastán Lanaspa, María HelenaTamm, AileKukli, KaupoThin filmsLáminas delgadasAtomic layer depositionDeposición atómica de capasProducción CientíficaAtomic layer deposition method was employed to deposit thin films consisting of ZrO2 and HfO2. Zirconia films were doped with hafnia and vice versa, and also nanolaminates were formed. All depositions were carried out at 300°C. Most films were crystalline in their as-deposited state. Zirconia exhibited the metastable cubic and tetragonal phases by a large majority, whereas hafnia was mostly in its stable monoclinic phase. Magnetic and electrical properties of the films were assessed. Un-doped zirconia was ferromagnetic and this property diminished with increasing the amount of hafnia in a film. All films exhibited ferroelectric-like behavior and the polarization curves also changed with respect to the film composition.Fondo Europeo de Desarrollo Regional (project TK134)Ministerio de Economía, Industria y Competitividad (grant TEC2017-84321-C4-2-R)Estonian Research Agency (grants IUT2-24 and PRG4)IOP Publishing2018info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://doi.org/10.1149/2.0041809jsshttp://uvadoc.uva.es/handle/10324/44663reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolidinstname:Universidad de ValladolidIngléshttps://iopscience.iop.org/article/10.1149/2.0041809jssinfo:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-nd/4.0/oai:uvadoc.uva.es:10324/446632026-06-13T12:44:47Z
dc.title.none.fl_str_mv Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
title Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
spellingShingle Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
Kalam, Kristjan
Thin films
Láminas delgadas
Atomic layer deposition
Deposición atómica de capas
title_short Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
title_full Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
title_fullStr Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
title_full_unstemmed Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
title_sort Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films
dc.creator.none.fl_str_mv Kalam, Kristjan
Seemen, Helina
Mikkor, Mats
Ritslaid, Peeter
Stern, Raivo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author Kalam, Kristjan
author_facet Kalam, Kristjan
Seemen, Helina
Mikkor, Mats
Ritslaid, Peeter
Stern, Raivo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author_role author
author2 Seemen, Helina
Mikkor, Mats
Ritslaid, Peeter
Stern, Raivo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author2_role author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Thin films
Láminas delgadas
Atomic layer deposition
Deposición atómica de capas
topic Thin films
Láminas delgadas
Atomic layer deposition
Deposición atómica de capas
description Producción Científica
publishDate 2018
dc.date.none.fl_str_mv 2018
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://doi.org/10.1149/2.0041809jss
http://uvadoc.uva.es/handle/10324/44663
url https://doi.org/10.1149/2.0041809jss
http://uvadoc.uva.es/handle/10324/44663
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv https://iopscience.iop.org/article/10.1149/2.0041809jss
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-nd/4.0/
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by-nc-nd/4.0/
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv IOP Publishing
publisher.none.fl_str_mv IOP Publishing
dc.source.none.fl_str_mv reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname:Universidad de Valladolid
instname_str Universidad de Valladolid
reponame_str UVaDOC. Repositorio Documental de la Universidad de Valladolid
collection UVaDOC. Repositorio Documental de la Universidad de Valladolid
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869423625298247680
score 15.300719

Similares en LA Referencia