Cita APA

Kalam, K., Seemen, H., Mikkor, M., Ritslaid, P., Stern, R., Dueñas Carazo, S., . . . Kukli, K. (2018). Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films.

Citación estilo Chicago

Kalam, Kristjan, Helina Seemen, Mats Mikkor, Peeter Ritslaid, Raivo Stern, Salvador Dueñas Carazo, María Helena Castán Lanaspa, Aile Tamm, y Kaupo Kukli. Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films. 2018.

Cita MLA

Kalam, Kristjan, et al. Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films. 2018.