Semi-empirical RF MOST model for CMOS 65 nm technologies: theory, extraction method and validation
This paper presents a simple but accurate semi-empirical model especially focused on 65 nm MOST (MOS transistor) technologies and radio-frequency (RF) applications. It is obtained by means of simple dc and noise simulations extracted over a constrained set of MOSTs. The fundamental variable of the m...
| Autores: | , |
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| Tipo de recurso: | artículo |
| Estado: | Versión aceptada para publicación |
| Fecha de publicación: | 2016 |
| País: | España |
| Institución: | Universidad de Sevilla (US) |
| Repositorio: | idUS. Depósito de Investigación de la Universidad de Sevilla |
| OAI Identifier: | oai:idus.us.es:11441/74308 |
| Acceso en línea: | https://hdl.handle.net/11441/74308 https://doi.org/10.1016/j.vlsi.2015.07.018 |
| Access Level: | acceso abierto |
| Palabra clave: | MOS transistor gm/ID Semi-empirical RF Nanometer technology 65 nm CMOS Inversion level CS-LNA |
| Sumario: | This paper presents a simple but accurate semi-empirical model especially focused on 65 nm MOST (MOS transistor) technologies and radio-frequency (RF) applications. It is obtained by means of simple dc and noise simulations extracted over a constrained set of MOSTs. The fundamental variable of the model is the MOST transconductance to current drain ratio gm/ID. Specifically it comprises the large signal DC normalized current, all conductances and transconductances and the normalized intrinsic capacitances. As well, noise MOST characteristics of flicker noise, white noise and MOST corner frequency description are provided. To validate the referred model the widely utilized cascoded common source low noise amplifier (CS-LNA), in 2.5 GHz and 5.3 GHz RF applications is picked. For the presented set of designs different gm/ID ratios are considered. Finally, the computed results are assessed by comparing with the outcomes of electrical simulations. |
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