Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes
[EN]By means of Monte Carlo simulations of gallium nitride(GaN) planar Gunn diodes,the epilayer structure on which they are fabricated is optimized in order to achieve ultrahigh-frequency oscillations. Practical considerations, such as the limitations of the technological fabrication process and the...
| Autores: | , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión borrador |
| Fecha de publicación: | 2022 |
| País: | España |
| Institución: | Universidad de Salamanca (USAL) |
| Repositorio: | GREDOS. Repositorio Institucional de la Universidad de Salamanca |
| OAI Identifier: | oai:gredos.usal.es:10366/167222 |
| Acceso en línea: | http://hdl.handle.net/10366/167222 |
| Access Level: | acceso abierto |
| Palabra clave: | Doped gallium nitride(GaN) Monte Carlo simulations Gunn diodes Terahertz (THz) generation 2203 Electrónica |
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Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn DiodesGarcia Sanchez, S.Íñiguez de la Torre Mulas, IgnacioPérez Santos, María SusanaGonzález Sánchez, TomásMateos López, JavierDoped gallium nitride(GaN)Monte Carlo simulationsGunn diodesTerahertz (THz) generation2203 Electrónica[EN]By means of Monte Carlo simulations of gallium nitride(GaN) planar Gunn diodes,the epilayer structure on which they are fabricated is optimized in order to achieve ultrahigh-frequency oscillations. Practical considerations, such as the limitations of the technological fabrication process and the mitigation of the huge self-heating effects expected to appear in the devices, have been also contem plated for the choice of the optimal epilayer parameters.The best results are obtained for an active layer thickness of 150 nmwith doping of 5 × 1018 cm−3, which would provide 350GHzGunnoscillationswhenusingacontactseparation of 0.5 μm.IEEE202520252022info:eu-repo/semantics/articleinfo:eu-repo/semantics/draftapplication/pdfhttp://hdl.handle.net/10366/167222reponame:GREDOS. Repositorio Institucional de la Universidad de Salamancainstname:Universidad de Salamanca (USAL)InglésTEC2017-83910-RSA254P18NRF2017-NRF-ANR003Attribution-NonCommercial-NoDerivatives 4.0 Internacionalhttp://creativecommons.org/licenses/by-nc-nd/4.0/info:eu-repo/semantics/openAccessoai:gredos.usal.es:10366/1672222026-06-07T06:28:51Z |
| dc.title.none.fl_str_mv |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| title |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| spellingShingle |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes Garcia Sanchez, S. Doped gallium nitride(GaN) Monte Carlo simulations Gunn diodes Terahertz (THz) generation 2203 Electrónica |
| title_short |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| title_full |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| title_fullStr |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| title_full_unstemmed |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| title_sort |
Optimization of the Epilayer Design for the Fabrication of Doped GaN Planar Gunn Diodes |
| dc.creator.none.fl_str_mv |
Garcia Sanchez, S. Íñiguez de la Torre Mulas, Ignacio Pérez Santos, María Susana González Sánchez, Tomás Mateos López, Javier |
| author |
Garcia Sanchez, S. |
| author_facet |
Garcia Sanchez, S. Íñiguez de la Torre Mulas, Ignacio Pérez Santos, María Susana González Sánchez, Tomás Mateos López, Javier |
| author_role |
author |
| author2 |
Íñiguez de la Torre Mulas, Ignacio Pérez Santos, María Susana González Sánchez, Tomás Mateos López, Javier |
| author2_role |
author author author author |
| dc.subject.none.fl_str_mv |
Doped gallium nitride(GaN) Monte Carlo simulations Gunn diodes Terahertz (THz) generation 2203 Electrónica |
| topic |
Doped gallium nitride(GaN) Monte Carlo simulations Gunn diodes Terahertz (THz) generation 2203 Electrónica |
| description |
[EN]By means of Monte Carlo simulations of gallium nitride(GaN) planar Gunn diodes,the epilayer structure on which they are fabricated is optimized in order to achieve ultrahigh-frequency oscillations. Practical considerations, such as the limitations of the technological fabrication process and the mitigation of the huge self-heating effects expected to appear in the devices, have been also contem plated for the choice of the optimal epilayer parameters.The best results are obtained for an active layer thickness of 150 nmwith doping of 5 × 1018 cm−3, which would provide 350GHzGunnoscillationswhenusingacontactseparation of 0.5 μm. |
| publishDate |
2022 |
| dc.date.none.fl_str_mv |
2022 2025 2025 |
| dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/draft |
| format |
article |
| status_str |
draft |
| dc.identifier.none.fl_str_mv |
http://hdl.handle.net/10366/167222 |
| url |
http://hdl.handle.net/10366/167222 |
| dc.language.none.fl_str_mv |
Inglés |
| language_invalid_str_mv |
Inglés |
| dc.relation.none.fl_str_mv |
TEC2017-83910-R SA254P18 NRF2017-NRF-ANR003 |
| dc.rights.none.fl_str_mv |
Attribution-NonCommercial-NoDerivatives 4.0 Internacional http://creativecommons.org/licenses/by-nc-nd/4.0/ info:eu-repo/semantics/openAccess |
| rights_invalid_str_mv |
Attribution-NonCommercial-NoDerivatives 4.0 Internacional http://creativecommons.org/licenses/by-nc-nd/4.0/ |
| eu_rights_str_mv |
openAccess |
| dc.format.none.fl_str_mv |
application/pdf |
| dc.publisher.none.fl_str_mv |
IEEE |
| publisher.none.fl_str_mv |
IEEE |
| dc.source.none.fl_str_mv |
reponame:GREDOS. Repositorio Institucional de la Universidad de Salamanca instname:Universidad de Salamanca (USAL) |
| instname_str |
Universidad de Salamanca (USAL) |
| reponame_str |
GREDOS. Repositorio Institucional de la Universidad de Salamanca |
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GREDOS. Repositorio Institucional de la Universidad de Salamanca |
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1869404621908213760 |
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15,811543 |