Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities

This article is part of a Special issue entitled: ‘NanoProcess 2024’ published in Micro and Nano Engineering

Bibliographic Details
Authors:	Scattolo, E., Cian, Alessandro, Llobet, Jordi, Borrisé, Xavier, Mondal, S., Barozzi, M., Bagolini, A., Crivellari, M., Perez Murano, Francesc X., Giubertoni, Damiano
Format:	article
Status:	Published version
Publication Date:	2025
Country:	España
Institution:	Consejo Superior de Investigaciones Científicas (CSIC)
Repository:	DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:	oai:digital.csic.es:10261/399441
Online Access:	http://hdl.handle.net/10261/399441 https://api.elsevier.com/content/abstract/scopus_id/105009462874
Access Level:	Open access
Keyword:	Maskless Nanofabrication Silicon nanowires

Description
Summary:	This article is part of a Special issue entitled: ‘NanoProcess 2024’ published in Micro and Nano Engineering