Analog performance of GaN/AlGaN high-electron-mobility transistors

In this paper, the analog properties of advanced GaN/AlGaN High-Electron-Mobility Transistors (HEMTs) are studied as a function of temperature (T). The drain current, the threshold voltage, the transconductance and the output conductance are experimentally investigated under saturation operation. Mo...

Descripción completa

Detalles Bibliográficos
Autores: de Oliveira Bergamim, Luis Felipe [UNESP], Parvais, Bertrand, Simoen, Eddy, Caño de Andrade, Maria Glória [UNESP]
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2021
País:Brasil
Institución:Universidade Estadual Paulista (UNESP)
Repositorio:Repositório Institucional da UNESP
Idioma:inglés
OAI Identifier:oai:repositorio.unesp.br:11449/208727
Acceso en línea:http://dx.doi.org/10.1016/j.sse.2021.108048
http://hdl.handle.net/11449/208727
Access Level:acceso abierto
Palabra clave:Analog performance
GaN/AlGaN
HEMT
High temperature
Descripción
Sumario:In this paper, the analog properties of advanced GaN/AlGaN High-Electron-Mobility Transistors (HEMTs) are studied as a function of temperature (T). The drain current, the threshold voltage, the transconductance and the output conductance are experimentally investigated under saturation operation. Moreover, important figures of merit for the analog performance, such as transconductance-over-drain current, Early voltage and intrinsic voltage gain are analyzed for different channel lengths in the temperature range of 25 °C till 200 °C. The results indicate that due to change in the Fermi potential, the analog parameters reduce with increasing T. Furthermore, the performance increase for longer channel devices is correlated directly with the lower drain electric field penetration.