Characterization of luminescent samarium doped HfO2 coatings synthesized by spray pyrolysis technique
Trivalent samarium (Sm3+) doped hafnium oxide (HfO2) films were deposited using the spray pyrolysis deposition technique. The films were deposited on Corning glass substrates at temperatures ranging from 300 to 550 ◦C using chlorides as raw materials. Films, mostly amorphous, were obtained when depo...
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2008 |
| País: | México |
| Institución: | Instituto Politécnico Nacional |
| Repositorio: | Repositorio Digital del IPN |
| OAI Identifier: | oai:www.repositoriodigital.ipn.mx:123456789/11613 |
| Acceso en línea: | http://hdl.handle.net/123456789/1145 http://www.repositoriodigital.ipn.mx/handle/123456789/11613 |
| Access Level: | acceso abierto |
| Palabra clave: | HAFNIUM OXIDE SAMARIUM |
| Sumario: | Trivalent samarium (Sm3+) doped hafnium oxide (HfO2) films were deposited using the spray pyrolysis deposition technique. The films were deposited on Corning glass substrates at temperatures ranging from 300 to 550 ◦C using chlorides as raw materials. Films, mostly amorphous, were obtained when deposition temperatures were below 350 ◦C. However, for temperatures higher than 400 ◦C, the films became polycrystalline, presenting the HfO2 monoclinic phase. Scanning electron microscopy of the films revealed a rough surface morphology with spherical particles. Also, electron energy dispersive analysis was performed on these films. The photoluminescence and cathodoluminescence characteristics of the HfO2 : SmCl3 films, measured at room temperature, exhibited four main bands centred at 570, 610, 652 and 716 nm, which are due to the well-known intra-4f transitions of the Sm3+ ion. It was found that the overall emission intensity rose as the deposition temperature was increased. Furthermore, a concentration quenching of the luminescence intensity was also observed. |
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