Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques
Thin films on PEEK have been designing by magnetron sputtering, using bias voltages ranging from −31 to −157 V. The X-ray diffraction and EDX show how the amorphous films resulting have an elemental composition very close to the stoichiometry TiSi. The AFM and SEM performed on top and cross-section,...
| Autores: | , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión aceptada para publicación |
| Fecha de publicación: | 2021 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/251046 |
| Acceso en línea: | http://hdl.handle.net/10261/251046 |
| Access Level: | acceso abierto |
| Palabra clave: | Residual stresses Sputtering thin film coatings Scratch resistance Fracture toughness Nano-indentation Load-bearing transfer applications |
| Sumario: | Thin films on PEEK have been designing by magnetron sputtering, using bias voltages ranging from −31 to −157 V. The X-ray diffraction and EDX show how the amorphous films resulting have an elemental composition very close to the stoichiometry TiSi. The AFM and SEM performed on top and cross-section, respectively, of film reveal a smooth and uniform surface, free of pores and cracks, and a compact microstructure. The evaluation of the resolved shear stress, yield strength, hardness, scratch resistance, and fracture toughness show how these values increase in the TiSi/PEEK system as the bias voltage increase. The development of these hard and tough thin films has enabled the fracture toughness achieved by the TiSi/PEEK system increase when a bias voltage equal to or higher than −108 V is used during the deposition process. For these bias conditions, the compressive residual stresses generated are large enough to prevent crack nucleation. The increase of the crack resistance gives as a result that K reaches values above 32 MPa*m. This value is much greater than those values corresponding to the classic ceramic coatings, such as AlO (4.6 MPa*m) and ZrO (7.6 MPa*m). |
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