Technological solution for the automatic replacement of the catalytic filaments in HWCVD

The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Prob...

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Detalhes bibliográficos
Autores: Nos Aguilà, Oriol, Frigeri, Paolo Antonio, Bertomeu i Balagueró, Joan
Formato: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2015
País:España
Recursos:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Repositorio:Recercat. Dipósit de la Recerca de Catalunya
OAI Identifier:oai:recercat.cat:2445/61845
Acesso em linha:https://hdl.handle.net/2445/61845
Access Level:acceso abierto
Palavra-chave:Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Chemical vapor deposition
Silicon
Catalysis
Thin films
id ES_bc3b3c2f31fa3a64f20be60185dd9b07
oai_identifier_str oai:recercat.cat:2445/61845
network_acronym_str ES
network_name_str España
repository_id_str
spelling Technological solution for the automatic replacement of the catalytic filaments in HWCVDNos Aguilà, OriolFrigeri, Paolo AntonioBertomeu i Balagueró, JoanDeposició química en fase vaporSiliciCatàlisiPel·lícules finesChemical vapor depositionSiliconCatalysisThin filmsThe degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.Elsevier2015201520152015info:eu-repo/semantics/articleinfo:eu-repo/semantics/acceptedVersion15 p.application/pdfhttps://hdl.handle.net/2445/61845Articles publicats en revistes (Física Aplicada)reponame:Recercat. Dipósit de la Recerca de Catalunyainstname:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)InglésVersió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010Thin Solid Films, 2015, vol. 575, p. 30-33http://dx.doi.org/10.1016/j.tsf.2014.10.010(c) Elsevier, 2015info:eu-repo/semantics/openAccessoai:recercat.cat:2445/618452026-05-29T05:05:01Z
dc.title.none.fl_str_mv Technological solution for the automatic replacement of the catalytic filaments in HWCVD
title Technological solution for the automatic replacement of the catalytic filaments in HWCVD
spellingShingle Technological solution for the automatic replacement of the catalytic filaments in HWCVD
Nos Aguilà, Oriol
Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Chemical vapor deposition
Silicon
Catalysis
Thin films
title_short Technological solution for the automatic replacement of the catalytic filaments in HWCVD
title_full Technological solution for the automatic replacement of the catalytic filaments in HWCVD
title_fullStr Technological solution for the automatic replacement of the catalytic filaments in HWCVD
title_full_unstemmed Technological solution for the automatic replacement of the catalytic filaments in HWCVD
title_sort Technological solution for the automatic replacement of the catalytic filaments in HWCVD
dc.creator.none.fl_str_mv Nos Aguilà, Oriol
Frigeri, Paolo Antonio
Bertomeu i Balagueró, Joan
author Nos Aguilà, Oriol
author_facet Nos Aguilà, Oriol
Frigeri, Paolo Antonio
Bertomeu i Balagueró, Joan
author_role author
author2 Frigeri, Paolo Antonio
Bertomeu i Balagueró, Joan
author2_role author
author
dc.subject.none.fl_str_mv Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Chemical vapor deposition
Silicon
Catalysis
Thin films
topic Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Chemical vapor deposition
Silicon
Catalysis
Thin films
description The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.
publishDate 2015
dc.date.none.fl_str_mv 2015
2015
2015
2015
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/acceptedVersion
format article
status_str acceptedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/2445/61845
url https://hdl.handle.net/2445/61845
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010
Thin Solid Films, 2015, vol. 575, p. 30-33
http://dx.doi.org/10.1016/j.tsf.2014.10.010
dc.rights.none.fl_str_mv (c) Elsevier, 2015
info:eu-repo/semantics/openAccess
rights_invalid_str_mv (c) Elsevier, 2015
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 15 p.
application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv Articles publicats en revistes (Física Aplicada)
reponame:Recercat. Dipósit de la Recerca de Catalunya
instname:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
instname_str Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
reponame_str Recercat. Dipósit de la Recerca de Catalunya
collection Recercat. Dipósit de la Recerca de Catalunya
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869418095579234304
score 15.812429

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