SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers

Traditionally porous silicon based photonic structures have been prepared by electrochemically etching of silicon. In this work, porous multilayers of nanocolumnar SiOx and SiO2 thin films acting as near infrared (NIR) 1D-photonic nanostructures are prepared by magnetron sputtering deposition at obl...

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Autores: García-Valenzuela, Aurelio, Álvarez, Rafael, Espinós, J.P., Rico, Víctor J., Gil-Rostra, J., Palmero, Alberto, González-Elipe, Agustín R.
Tipo de recurso: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2019
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/183677
Acceso en línea:http://hdl.handle.net/10261/183677
Access Level:acceso abierto
Palabra clave:SiOx thin films
Magnetron sputtering
OAD
NIR optofluidics
Label free photonic
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spelling SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayersGarcía-Valenzuela, AurelioÁlvarez, RafaelEspinós, J.P.Rico, Víctor J.Gil-Rostra, J.Palmero, AlbertoGonzález-Elipe, Agustín R.SiOx thin filmsMagnetron sputteringOADNIR optofluidicsLabel free photonicTraditionally porous silicon based photonic structures have been prepared by electrochemically etching of silicon. In this work, porous multilayers of nanocolumnar SiOx and SiO2 thin films acting as near infrared (NIR) 1D-photonic nanostructures are prepared by magnetron sputtering deposition at oblique angles (MS-OA). Simultaneous control of porosity and stoichiometry of the stacked films is achieved by adjusting the deposition angle and oxygen partial pressure according to a parametric formula. This new methodologoy is proved for the synthesis of SiOx thin films with x close to 0.4, 0.8, 1.2, 1.6 and nanostructures varying from compact (at 0° deposition angle) to highly porous and nanocolumnar (at 70° and 85° deposition angles). The strict control of composition, structure and nanostructure provided by this technique permits a fine tuning of the absorption edge and refraction index at 1500 nm of the porous films and their manufacturing in the form of SiOx-SiO2 porous multilayers acting as near infrared (NIR) 1D-photonic structures with well-defined optofluidic responses. Liquid tunable NIR Bragg mirrors and Bragg microcavities for liquid sensing applications are presented as proof of concept of the possibilities of this MS-OA manufacturing method as an alternative to the conventional electrochemical fabrication of silicon based photonic structures.Peer reviewedElsevierConsejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]201920192019info:eu-repo/semantics/articlehttp://purl.org/coar/resource_type/c_6501Postprintinfo:eu-repo/semantics/acceptedVersionhttp://hdl.handle.net/10261/183677reponame:DIGITAL.CSIC. Repositorio Institucional del CSICinstname:Consejo Superior de Investigaciones Científicas (CSIC)Ingléshttps://doi.org/10.1016/j.apsusc.2019.05.273Síinfo:eu-repo/semantics/openAccessoai:digital.csic.es:10261/1836772026-05-22T06:33:51Z
dc.title.none.fl_str_mv SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
title SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
spellingShingle SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
García-Valenzuela, Aurelio
SiOx thin films
Magnetron sputtering
OAD
NIR optofluidics
Label free photonic
title_short SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
title_full SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
title_fullStr SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
title_full_unstemmed SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
title_sort SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers
dc.creator.none.fl_str_mv García-Valenzuela, Aurelio
Álvarez, Rafael
Espinós, J.P.
Rico, Víctor J.
Gil-Rostra, J.
Palmero, Alberto
González-Elipe, Agustín R.
author García-Valenzuela, Aurelio
author_facet García-Valenzuela, Aurelio
Álvarez, Rafael
Espinós, J.P.
Rico, Víctor J.
Gil-Rostra, J.
Palmero, Alberto
González-Elipe, Agustín R.
author_role author
author2 Álvarez, Rafael
Espinós, J.P.
Rico, Víctor J.
Gil-Rostra, J.
Palmero, Alberto
González-Elipe, Agustín R.
author2_role author
author
author
author
author
author
dc.contributor.none.fl_str_mv Consejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]
dc.subject.none.fl_str_mv SiOx thin films
Magnetron sputtering
OAD
NIR optofluidics
Label free photonic
topic SiOx thin films
Magnetron sputtering
OAD
NIR optofluidics
Label free photonic
description Traditionally porous silicon based photonic structures have been prepared by electrochemically etching of silicon. In this work, porous multilayers of nanocolumnar SiOx and SiO2 thin films acting as near infrared (NIR) 1D-photonic nanostructures are prepared by magnetron sputtering deposition at oblique angles (MS-OA). Simultaneous control of porosity and stoichiometry of the stacked films is achieved by adjusting the deposition angle and oxygen partial pressure according to a parametric formula. This new methodologoy is proved for the synthesis of SiOx thin films with x close to 0.4, 0.8, 1.2, 1.6 and nanostructures varying from compact (at 0° deposition angle) to highly porous and nanocolumnar (at 70° and 85° deposition angles). The strict control of composition, structure and nanostructure provided by this technique permits a fine tuning of the absorption edge and refraction index at 1500 nm of the porous films and their manufacturing in the form of SiOx-SiO2 porous multilayers acting as near infrared (NIR) 1D-photonic structures with well-defined optofluidic responses. Liquid tunable NIR Bragg mirrors and Bragg microcavities for liquid sensing applications are presented as proof of concept of the possibilities of this MS-OA manufacturing method as an alternative to the conventional electrochemical fabrication of silicon based photonic structures.
publishDate 2019
dc.date.none.fl_str_mv 2019
2019
2019
dc.type.none.fl_str_mv info:eu-repo/semantics/article
http://purl.org/coar/resource_type/c_6501
Postprint
info:eu-repo/semantics/acceptedVersion
format article
status_str acceptedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/10261/183677
url http://hdl.handle.net/10261/183677
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv https://doi.org/10.1016/j.apsusc.2019.05.273
Sí
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:DIGITAL.CSIC. Repositorio Institucional del CSIC
instname:Consejo Superior de Investigaciones Científicas (CSIC)
instname_str Consejo Superior de Investigaciones Científicas (CSIC)
reponame_str DIGITAL.CSIC. Repositorio Institucional del CSIC
collection DIGITAL.CSIC. Repositorio Institucional del CSIC
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15,811543

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