Analytical predictive 2d modeling of pinch-off behavior in nanoscale multi-gate mosfets

In this thesis the pinch-off behavior in nanoscale Multi-Gate MOSFETs was reviewed and with compact models described. For this a 2D approach with Schwarz-Christoffel conformal mapping technique was used. A model to calculate the current in single gate MOSFETs was derived and compared to device simul...

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Detalhes bibliográficos
Autor: Weidemann, Michaela Patricia
Formato: tesis doctoral
Estado:Versión publicada
Fecha de publicación:2011
País:España
Recursos:CBUC, CESCA
Repositorio:TDR. Tesis Doctorales en Red
OAI Identifier:oai:www.tdx.cat:10803/52800
Acesso em linha:http://hdl.handle.net/10803/52800
Access Level:acceso abierto
Palavra-chave:Modeling
Nanoscale
Multi-gate
Mosfet
621.3
Descrição
Resumo:In this thesis the pinch-off behavior in nanoscale Multi-Gate MOSFETs was reviewed and with compact models described. For this a 2D approach with Schwarz-Christoffel conformal mapping technique was used. A model to calculate the current in single gate MOSFETs was derived and compared to device simulations from TCAD Sentaurus down to 50nm. For the DoubleGate MOSFET a new way to define the saturation point was found. A fully 2D closed-form model to locate this point was created. It was also found that with quantum mechanics effects a pinch-off point can occur and can be described with the same model. Furthermore the model was extended to describe the coupled pinch-off points in an asymmetrical biased DoubleGate MOSET with an even an odd mode. Also the saturation point behavior in FinFETs was examinated.