Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

http://link.aip.org/link/?JAPIAU/103/056108/1

Detalles Bibliográficos
Autores: Martínez Pastor, Juan Pascual, Fuster, David, Abellán Rubio, María de los Ángeles, Anguita, José Virgilio, Sochinskii, N. V.
Tipo de recurso: artículo
Fecha de publicación:2008
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/11694
Acceso en línea:http://hdl.handle.net/10261/11694
Access Level:acceso abierto
Palabra clave:Cadmium compounds
Etching
II-VI semiconductors
Impurities
Ion beam assisted deposition
MOCVD
Photoluminescence
Sapphire
Semiconductor epitaxial layers
Spectral line intensity
Vapour phase epitaxial growth
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spelling Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layersMartínez Pastor, Juan PascualFuster, DavidAbellán Rubio, María de los ÁngelesAnguita, José VirgilioSochinskii, N. V.Cadmium compoundsEtchingII-VI semiconductorsImpuritiesIon beam assisted depositionMOCVDPhotoluminescenceSapphireSemiconductor epitaxial layersSpectral line intensityVapour phase epitaxial growthhttp://link.aip.org/link/?JAPIAU/103/056108/1We demonstrated the effect of reactive ion beam etching (RIBE) process on the PL properties of CdTe/sapphire metal organic vapor phase epitaxy layers. At optimum conditions, the RIBE attack does not make significant morphological changes but it results in an increase of the concentration of acceptor impurities. This was revealed by an increase of the overall photoluminescence (PL) intensity and, simultaneously, a decrease of the PL decay time, more important on the low energy side of PL spectrum due to the recombination of carriers in acceptor pairs.This work was supported by the Spanish projects TEC-2005-05781-C03-03 and CAM SENSORCDT S-0505/MAT/0209.Peer reviewedAmerican Institute of Physics200920092008info:eu-repo/semantics/articlehttp://purl.org/coar/resource_type/c_6501296992 bytesapplication/pdfhttp://hdl.handle.net/10261/11694reponame:DIGITAL.CSIC. Repositorio Institucional del CSICinstname:Consejo Superior de Investigaciones Científicas (CSIC)Ingléshttp://dx.doi.org/10.1063/1.2874480info:eu-repo/semantics/openAccessoai:digital.csic.es:10261/116942026-05-22T06:33:51Z
dc.title.none.fl_str_mv Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
title Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
spellingShingle Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
Martínez Pastor, Juan Pascual
Cadmium compounds
Etching
II-VI semiconductors
Impurities
Ion beam assisted deposition
MOCVD
Photoluminescence
Sapphire
Semiconductor epitaxial layers
Spectral line intensity
Vapour phase epitaxial growth
title_short Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
title_full Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
title_fullStr Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
title_full_unstemmed Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
title_sort Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
dc.creator.none.fl_str_mv Martínez Pastor, Juan Pascual
Fuster, David
Abellán Rubio, María de los Ángeles
Anguita, José Virgilio
Sochinskii, N. V.
author Martínez Pastor, Juan Pascual
author_facet Martínez Pastor, Juan Pascual
Fuster, David
Abellán Rubio, María de los Ángeles
Anguita, José Virgilio
Sochinskii, N. V.
author_role author
author2 Fuster, David
Abellán Rubio, María de los Ángeles
Anguita, José Virgilio
Sochinskii, N. V.
author2_role author
author
author
author
dc.subject.none.fl_str_mv Cadmium compounds
Etching
II-VI semiconductors
Impurities
Ion beam assisted deposition
MOCVD
Photoluminescence
Sapphire
Semiconductor epitaxial layers
Spectral line intensity
Vapour phase epitaxial growth
topic Cadmium compounds
Etching
II-VI semiconductors
Impurities
Ion beam assisted deposition
MOCVD
Photoluminescence
Sapphire
Semiconductor epitaxial layers
Spectral line intensity
Vapour phase epitaxial growth
description http://link.aip.org/link/?JAPIAU/103/056108/1
publishDate 2008
dc.date.none.fl_str_mv 2008
2009
2009
dc.type.none.fl_str_mv info:eu-repo/semantics/article
http://purl.org/coar/resource_type/c_6501
format article
dc.identifier.none.fl_str_mv http://hdl.handle.net/10261/11694
url http://hdl.handle.net/10261/11694
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv http://dx.doi.org/10.1063/1.2874480
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 296992 bytes
application/pdf
dc.publisher.none.fl_str_mv American Institute of Physics
publisher.none.fl_str_mv American Institute of Physics
dc.source.none.fl_str_mv reponame:DIGITAL.CSIC. Repositorio Institucional del CSIC
instname:Consejo Superior de Investigaciones Científicas (CSIC)
instname_str Consejo Superior de Investigaciones Científicas (CSIC)
reponame_str DIGITAL.CSIC. Repositorio Institucional del CSIC
collection DIGITAL.CSIC. Repositorio Institucional del CSIC
repository.name.fl_str_mv
repository.mail.fl_str_mv
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