Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy
The following article appeared in Journal of Applied Physics 126.10 (2019): 105704 and may be found at https://aip.scitation.org/doi/full/10.1063/1.5111090
| Autores: | , , , , |
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| Formato: | artículo |
| Fecha de publicación: | 2019 |
| País: | España |
| Recursos: | Universidad Autónoma de Madrid |
| Repositorio: | Biblos-e Archivo. Repositorio Institucional de la UAM |
| Idioma: | inglés |
| OAI Identifier: | oai:repositorio.uam.es:10486/706128 |
| Acesso em linha: | http://hdl.handle.net/10486/706128 https://dx.doi.org/10.1063/1.5111090 |
| Access Level: | acceso abierto |
| Palavra-chave: | III-V Semiconductors Gallium Arsenides Semiconductor Quantum Wells Física |
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Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxyBen Saddik, K.Braña de Cal, Alejandro FranciscoLópez, N.Walukiewicz, W.García Carretero, Basilio JavierIII-V SemiconductorsGallium ArsenidesSemiconductor Quantum WellsFísicaThe following article appeared in Journal of Applied Physics 126.10 (2019): 105704 and may be found at https://aip.scitation.org/doi/full/10.1063/1.5111090Chemical beam epitaxy has been used to grow layers of GaP1-xNx, GaP1-yAsy, and nearly lattice-matched layers GaP1-x-yAsyNx on Si substrates. To address the issue of antiphase domain generation associated with the growth of polar semiconductors on Si, misoriented Si(001) substrates have been used combined with a carefully designed GaP buffer layer growth. The reflection high-energy electron diffraction pattern exhibits a (2 × 4) surface reconstruction after GaP buffer layer and GaP(As,N) graded layer growth, indicating the good surface quality and planarity of the grown layers. Sample composition was obtained by simultaneous acquisition of Rutherford backscattering spectrometry and nuclear reaction analysis, indicating a linear dependence of N and As mole fractions on the flux of their respective precursor. GaP1-x-yAsyNx layers grown on Si substrates have a lattice mismatch not larger than ±0.005 for N contents in the range 0.02 < x < 0.05. High-resolution X-ray diffraction reciprocal space maps demonstrate a good crystalline quality. Intense photoluminescence spectra have been measured in all GaP1-xNx and GaP1-x-yAsyNx layers, as it is expected for direct bandgap materials. Two wide overlapped emission peaks are observed in all the spectra, most likely related to near bandgap recombination. The position of the higher energy peak for GaP1-xNx and GaP1-x-yAsyNx layers has been compared to bandgap energy calculations using the band anticrossing model, showing good agreementAmerican Institute of PhysicsDepartamento de Física AplicadaFacultad de Ciencias20192019-09-10research articlehttp://purl.org/coar/resource_type/c_2df8fbb1VoRhttp://purl.org/coar/version/c_970fb48d4fbd8a85info:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10486/706128https://dx.doi.org/10.1063/1.5111090reponame:Biblos-e Archivo. Repositorio Institucional de la UAMinstname:Universidad Autónoma de MadridInglésengopen accesshttp://purl.org/coar/access_right/c_abf2info:eu-repo/semantics/openAccessoai:repositorio.uam.es:10486/7061282026-06-23T12:46:27Z |
| dc.title.none.fl_str_mv |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| title |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| spellingShingle |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy Ben Saddik, K. III-V Semiconductors Gallium Arsenides Semiconductor Quantum Wells Física |
| title_short |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| title_full |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| title_fullStr |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| title_full_unstemmed |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| title_sort |
Growth of GaP1-x-yAsyNx on Si substrates by chemical beam epitaxy |
| dc.creator.none.fl_str_mv |
Ben Saddik, K. Braña de Cal, Alejandro Francisco López, N. Walukiewicz, W. García Carretero, Basilio Javier |
| author |
Ben Saddik, K. |
| author_facet |
Ben Saddik, K. Braña de Cal, Alejandro Francisco López, N. Walukiewicz, W. García Carretero, Basilio Javier |
| author_role |
author |
| author2 |
Braña de Cal, Alejandro Francisco López, N. Walukiewicz, W. García Carretero, Basilio Javier |
| author2_role |
author author author author |
| dc.contributor.none.fl_str_mv |
Departamento de Física Aplicada Facultad de Ciencias |
| dc.subject.none.fl_str_mv |
III-V Semiconductors Gallium Arsenides Semiconductor Quantum Wells Física |
| topic |
III-V Semiconductors Gallium Arsenides Semiconductor Quantum Wells Física |
| description |
The following article appeared in Journal of Applied Physics 126.10 (2019): 105704 and may be found at https://aip.scitation.org/doi/full/10.1063/1.5111090 |
| publishDate |
2019 |
| dc.date.none.fl_str_mv |
2019 2019-09-10 |
| dc.type.none.fl_str_mv |
research article http://purl.org/coar/resource_type/c_2df8fbb1 VoR http://purl.org/coar/version/c_970fb48d4fbd8a85 |
| dc.type.openaire.fl_str_mv |
info:eu-repo/semantics/article |
| format |
article |
| dc.identifier.none.fl_str_mv |
http://hdl.handle.net/10486/706128 https://dx.doi.org/10.1063/1.5111090 |
| url |
http://hdl.handle.net/10486/706128 https://dx.doi.org/10.1063/1.5111090 |
| dc.language.none.fl_str_mv |
Inglés eng |
| language_invalid_str_mv |
Inglés |
| language |
eng |
| dc.rights.none.fl_str_mv |
open access http://purl.org/coar/access_right/c_abf2 |
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info:eu-repo/semantics/openAccess |
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open access http://purl.org/coar/access_right/c_abf2 |
| eu_rights_str_mv |
openAccess |
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application/pdf |
| dc.publisher.none.fl_str_mv |
American Institute of Physics |
| publisher.none.fl_str_mv |
American Institute of Physics |
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reponame:Biblos-e Archivo. Repositorio Institucional de la UAM instname:Universidad Autónoma de Madrid |
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Universidad Autónoma de Madrid |
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Biblos-e Archivo. Repositorio Institucional de la UAM |
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Biblos-e Archivo. Repositorio Institucional de la UAM |
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