Resonant tunnelling features in a suspended silicon nanowire single-hole transistor

Suspended silicon nanowires have significant potential for a broad spectrum of device applications. A suspended p-type Si nanowire incorporating Si nanocrystal quantum dots has been used to form a single-hole transistor. Transistor fabrication uses a novel and rapid process, based on focused gallium...

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Detalhes bibliográficos
Autores: Llobet Sixto, Jordi|||0000-0001-7007-9277, Krali, Emiljana, Wang, Chen, Arbiol i Cobos, Jordi|||0000-0002-0695-1726, Jones, Mervyn E., Pérez Murano, Francesc|||0000-0002-4647-8558, Durrani, Zahid A. K.
Tipo de documento: artigo
Data de publicação:2015
País:España
Recursos:Universitat Autònoma de Barcelona
Repositório:Dipòsit Digital de Documents de la UAB
Idioma:inglês
OAI Identifier:oai:ddd.uab.cat:200186
Acesso em linha:https://ddd.uab.cat/record/200186
https://dx.doi.org/urn:doi:10.1063/1.4936757
Access Level:Acceso aberto
Palavra-chave:Anisotropic wet etching
Charging energies
Coulomb diamonds
Device application
Electrical characteristic
Ion beam exposure
Silicon nanowires
Single hole transistors
Descrição
Resumo:Suspended silicon nanowires have significant potential for a broad spectrum of device applications. A suspended p-type Si nanowire incorporating Si nanocrystal quantum dots has been used to form a single-hole transistor. Transistor fabrication uses a novel and rapid process, based on focused gallium ion beam exposure and anisotropic wet etching, generating <10 nm nanocrystals inside suspended Si nanowires. Electrical characteristics at 10 K show Coulomb diamonds with charging energy ∼27 meV, associated with a single dominant nanocrystal. Resonant tunnelling features with energy spacing ∼10 meV are observed, parallel to both diamond edges. These may be associated either with excited states or hole-acoustic phonon interactions, in the nanocrystal. In the latter case, the energy spacing corresponds well with reported Raman spectroscopy results and phonon spectra calculations.