Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications

[eng] Ultrafine particles of silicon and related binary and ternary alloys of the Si-B-C-N system produced in our research group from silane, methane, diborane, ammonia and nitrogen precursor gases by plasma enhanced chemical vapor deposition at low pressure and room temperature are reviewed. The in...

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Detalles Bibliográficos
Autores: Bertrán Serra, Enric, Costa i Balanzat, Josep, Viera Mármol, Gregorio, Andújar Bella, José Luis, Canillas i Biosca, Adolf, Pascual Miralles, Esther
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:1999
País:España
Institución:Universidad de Barcelona
Repositorio:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/22753
Acceso en línea:https://hdl.handle.net/2445/22753
Access Level:acceso abierto
Palabra clave:Silici
Nanopartícules
Materials nanoestructurats
Silicon
Nanoparticles
Nanostructured materials
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spelling Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applicationsBertrán Serra, EnricCosta i Balanzat, JosepViera Mármol, GregorioAndújar Bella, José LuisCanillas i Biosca, AdolfPascual Miralles, EstherSiliciNanopartículesMaterials nanoestructuratsSiliconNanoparticlesNanostructured materials[eng] Ultrafine particles of silicon and related binary and ternary alloys of the Si-B-C-N system produced in our research group from silane, methane, diborane, ammonia and nitrogen precursor gases by plasma enhanced chemical vapor deposition at low pressure and room temperature are reviewed. The in-situ techniques of plasma analysis and surface characterization (quadrupolar mass spectrometry, optical emission spectroscopy and ellipsometry) providing evidence of powder formation and the polymerization reactions based on the SinH2n- negative radicals electrically confined in the plasma sheath are described. The square wave modulation (SQWM) of the rf power is discussed as an efficient method of controlling the powder particle production with low particle-size dispersion. The properties of the powder particles determined by different structural characterization techniques providing their size and distribution, crystalline order and morphology, chemical composition and chemical bond vibrational characteristics, are analyzed and discussed[cat] Hom presenta una revisió sobre les partícules ultrafines de silici i els seus aliatges binaris i ternaris del sistema Si-B-C-N, produïdes en el nostre grup de recerca a partir dels gasos precursors silà, metà, diborà, amoníac i nitrogen, per dipòsit químic en fase vapor (CVD) reforçat per plasma, a baixa pressió i temperatura ambient. És descrita també la utilització de tècniques in situ d'anàlisi per plasma i de caracterització de superfícies (espectroscòpia de masses quadripolar, espectroscòpia òptica d’emissió i el·lipsometria), que donaren l’evidència de formació de partícules de pols i de reaccions de polimerització basades en radicals negatius SinH2n– confinats elèctricament en l’embolcall del plasma. La modulació d’ona quadrada (SQWM) de la font de rf és estudiada com un eficient mètode de control de la producció de partícules amb una petita dispersió de llurs dimensions. Finalment, hom analitza i discuteix les propietats de les partícules produïdes, determinades per diferents tècniques de caracterització, que permeteren obtenir llurs dimensions i distribució, ordre cristal·lí i morfologia, composició química i les característiques vibracionals dels enllaços químicsInstitut d'Estudis Catalans1999info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://hdl.handle.net/2445/22753Articles publicats en revistes (Física Aplicada)reponame:Dipòsit Digital de la UBinstname:Universidad de BarcelonaInglésReproducció digital del document publicat a: http://www.raco.cat/index.php/Contributions/article/view/157649/209540Contributions to Science, 1999, vol. 1, num. 1, p. 53-61cc-by-nc-sa (c) Bertrán Serra et al., 1999http://creativecommons.org/licenses/by-nc-sa/3.0/esinfo:eu-repo/semantics/openAccessoai:diposit.ub.edu:2445/227532026-05-27T06:46:51Z
dc.title.none.fl_str_mv Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
title Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
spellingShingle Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
Bertrán Serra, Enric
Silici
Nanopartícules
Materials nanoestructurats
Silicon
Nanoparticles
Nanostructured materials
title_short Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
title_full Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
title_fullStr Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
title_full_unstemmed Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
title_sort Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
dc.creator.none.fl_str_mv Bertrán Serra, Enric
Costa i Balanzat, Josep
Viera Mármol, Gregorio
Andújar Bella, José Luis
Canillas i Biosca, Adolf
Pascual Miralles, Esther
author Bertrán Serra, Enric
author_facet Bertrán Serra, Enric
Costa i Balanzat, Josep
Viera Mármol, Gregorio
Andújar Bella, José Luis
Canillas i Biosca, Adolf
Pascual Miralles, Esther
author_role author
author2 Costa i Balanzat, Josep
Viera Mármol, Gregorio
Andújar Bella, José Luis
Canillas i Biosca, Adolf
Pascual Miralles, Esther
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv Silici
Nanopartícules
Materials nanoestructurats
Silicon
Nanoparticles
Nanostructured materials
topic Silici
Nanopartícules
Materials nanoestructurats
Silicon
Nanoparticles
Nanostructured materials
description [eng] Ultrafine particles of silicon and related binary and ternary alloys of the Si-B-C-N system produced in our research group from silane, methane, diborane, ammonia and nitrogen precursor gases by plasma enhanced chemical vapor deposition at low pressure and room temperature are reviewed. The in-situ techniques of plasma analysis and surface characterization (quadrupolar mass spectrometry, optical emission spectroscopy and ellipsometry) providing evidence of powder formation and the polymerization reactions based on the SinH2n- negative radicals electrically confined in the plasma sheath are described. The square wave modulation (SQWM) of the rf power is discussed as an efficient method of controlling the powder particle production with low particle-size dispersion. The properties of the powder particles determined by different structural characterization techniques providing their size and distribution, crystalline order and morphology, chemical composition and chemical bond vibrational characteristics, are analyzed and discussed
publishDate 1999
dc.date.none.fl_str_mv 1999
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/2445/22753
url https://hdl.handle.net/2445/22753
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Reproducció digital del document publicat a: http://www.raco.cat/index.php/Contributions/article/view/157649/209540
Contributions to Science, 1999, vol. 1, num. 1, p. 53-61
dc.rights.none.fl_str_mv cc-by-nc-sa (c) Bertrán Serra et al., 1999
http://creativecommons.org/licenses/by-nc-sa/3.0/es
info:eu-repo/semantics/openAccess
rights_invalid_str_mv cc-by-nc-sa (c) Bertrán Serra et al., 1999
http://creativecommons.org/licenses/by-nc-sa/3.0/es
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Institut d'Estudis Catalans
publisher.none.fl_str_mv Institut d'Estudis Catalans
dc.source.none.fl_str_mv Articles publicats en revistes (Física Aplicada)
reponame:Dipòsit Digital de la UB
instname:Universidad de Barcelona
instname_str Universidad de Barcelona
reponame_str Dipòsit Digital de la UB
collection Dipòsit Digital de la UB
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15,300724

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