Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications
[eng] Ultrafine particles of silicon and related binary and ternary alloys of the Si-B-C-N system produced in our research group from silane, methane, diborane, ammonia and nitrogen precursor gases by plasma enhanced chemical vapor deposition at low pressure and room temperature are reviewed. The in...
| Autores: | , , , , , |
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| Formato: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 1999 |
| País: | España |
| Recursos: | Universidad de Barcelona |
| Repositorio: | Dipòsit Digital de la UB |
| OAI Identifier: | oai:diposit.ub.edu:2445/22753 |
| Acesso em linha: | https://hdl.handle.net/2445/22753 |
| Access Level: | acceso abierto |
| Palavra-chave: | Silici Nanopartícules Materials nanoestructurats Silicon Nanoparticles Nanostructured materials |
| Resumo: | [eng] Ultrafine particles of silicon and related binary and ternary alloys of the Si-B-C-N system produced in our research group from silane, methane, diborane, ammonia and nitrogen precursor gases by plasma enhanced chemical vapor deposition at low pressure and room temperature are reviewed. The in-situ techniques of plasma analysis and surface characterization (quadrupolar mass spectrometry, optical emission spectroscopy and ellipsometry) providing evidence of powder formation and the polymerization reactions based on the SinH2n- negative radicals electrically confined in the plasma sheath are described. The square wave modulation (SQWM) of the rf power is discussed as an efficient method of controlling the powder particle production with low particle-size dispersion. The properties of the powder particles determined by different structural characterization techniques providing their size and distribution, crystalline order and morphology, chemical composition and chemical bond vibrational characteristics, are analyzed and discussed |
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