Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
The nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis...
| Authors: | , , , , , , , , , , , |
|---|---|
| Format: | article |
| Status: | Versión enviada para evaluación y publicación |
| Publication Date: | 2020 |
| Country: | España |
| Institution: | Universidad de Sevilla (US) |
| Repository: | idUS. Depósito de Investigación de la Universidad de Sevilla |
| OAI Identifier: | oai:idus.us.es:11441/160604 |
| Online Access: | https://hdl.handle.net/11441/160604 https://doi.org/10.1016/j.micromeso.2019.109968 |
| Access Level: | Open access |
| Keyword: | Positron annihilation Micropores OAD thin films TiO2 SiO2 Growing mechanism |
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Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayersGarcía Valenzuela, AurelioButterling, MaikLiedke, Maciej OskarHirschmann, EricTrinh, Thu TrangAttallah, Ahmed G.Wagner, AndreasÁlvarez Molina, RafaelGil Rostra, JorgeRico, VíctorPalmero Acebedo, AlbertoGonzález Elipe, Agustín RodríguezPositron annihilationMicroporesOAD thin filmsTiO2SiO2Growing mechanismThe nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis of porosity, defects and internal interfaces of materials, and has been applied to different as-deposited SiO2 and TiO2 thin films as well as SiO2/TiO2 multilayers prepared by electron beam evaporation at 70° and 85° zenithal angles. It is shown that, under same deposition conditions, the concentration of internal nano-pores in SiO2 is higher than in TiO2 nanocolumns, while the situation is closer to this latter in TiO2/SiO2 multilayers. These features have been compared with the predictions of a Monte Carlo simulation of the film growth and explained by considering the influence of the chemical composition on the growth mechanism and, ultimately, on the structure of the films.Ministerio de Economia, Industria y Competitividad (MINECO). España MAT2016-79866-RConsejo Superior de Investigaciones Científicas (CSIC) 201560E055Ministerio de Economia, Industria y Competitividad (MINECO). España 201860E050Elsevier B.V.Física Aplicada IEuropean Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER)Ministerio de Economia, Industria y Competitividad (MINECO). EspañaConsejo Superior de Investigaciones Científicas (CSIC)2020info:eu-repo/semantics/articleinfo:eu-repo/semantics/submittedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/160604https://doi.org/10.1016/j.micromeso.2019.109968reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésMicroporous and Mesoporous Materials, 295, Article number 109968.MAT2016-79866-R201560E055201860E050https://www.sciencedirect.com/science/article/pii/S1387181119308273info:eu-repo/semantics/openAccessoai:idus.us.es:11441/1606042026-06-17T12:51:07Z |
| dc.title.none.fl_str_mv |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| title |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| spellingShingle |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers García Valenzuela, Aurelio Positron annihilation Micropores OAD thin films TiO2 SiO2 Growing mechanism |
| title_short |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| title_full |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| title_fullStr |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| title_full_unstemmed |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| title_sort |
Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers |
| dc.creator.none.fl_str_mv |
García Valenzuela, Aurelio Butterling, Maik Liedke, Maciej Oskar Hirschmann, Eric Trinh, Thu Trang Attallah, Ahmed G. Wagner, Andreas Álvarez Molina, Rafael Gil Rostra, Jorge Rico, Víctor Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author |
García Valenzuela, Aurelio |
| author_facet |
García Valenzuela, Aurelio Butterling, Maik Liedke, Maciej Oskar Hirschmann, Eric Trinh, Thu Trang Attallah, Ahmed G. Wagner, Andreas Álvarez Molina, Rafael Gil Rostra, Jorge Rico, Víctor Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author_role |
author |
| author2 |
Butterling, Maik Liedke, Maciej Oskar Hirschmann, Eric Trinh, Thu Trang Attallah, Ahmed G. Wagner, Andreas Álvarez Molina, Rafael Gil Rostra, Jorge Rico, Víctor Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author2_role |
author author author author author author author author author author author |
| dc.contributor.none.fl_str_mv |
Física Aplicada I European Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER) Ministerio de Economia, Industria y Competitividad (MINECO). España Consejo Superior de Investigaciones Científicas (CSIC) |
| dc.subject.none.fl_str_mv |
Positron annihilation Micropores OAD thin films TiO2 SiO2 Growing mechanism |
| topic |
Positron annihilation Micropores OAD thin films TiO2 SiO2 Growing mechanism |
| description |
The nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis of porosity, defects and internal interfaces of materials, and has been applied to different as-deposited SiO2 and TiO2 thin films as well as SiO2/TiO2 multilayers prepared by electron beam evaporation at 70° and 85° zenithal angles. It is shown that, under same deposition conditions, the concentration of internal nano-pores in SiO2 is higher than in TiO2 nanocolumns, while the situation is closer to this latter in TiO2/SiO2 multilayers. These features have been compared with the predictions of a Monte Carlo simulation of the film growth and explained by considering the influence of the chemical composition on the growth mechanism and, ultimately, on the structure of the films. |
| publishDate |
2020 |
| dc.date.none.fl_str_mv |
2020 |
| dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/submittedVersion |
| format |
article |
| status_str |
submittedVersion |
| dc.identifier.none.fl_str_mv |
https://hdl.handle.net/11441/160604 https://doi.org/10.1016/j.micromeso.2019.109968 |
| url |
https://hdl.handle.net/11441/160604 https://doi.org/10.1016/j.micromeso.2019.109968 |
| dc.language.none.fl_str_mv |
Inglés |
| language_invalid_str_mv |
Inglés |
| dc.relation.none.fl_str_mv |
Microporous and Mesoporous Materials, 295, Article number 109968. MAT2016-79866-R 201560E055 201860E050 https://www.sciencedirect.com/science/article/pii/S1387181119308273 |
| dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess |
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openAccess |
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application/pdf application/pdf |
| dc.publisher.none.fl_str_mv |
Elsevier B.V. |
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Elsevier B.V. |
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reponame:idUS. Depósito de Investigación de la Universidad de Sevilla instname:Universidad de Sevilla (US) |
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Universidad de Sevilla (US) |
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idUS. Depósito de Investigación de la Universidad de Sevilla |
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idUS. Depósito de Investigación de la Universidad de Sevilla |
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15.81155 |