Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers

The nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis...

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Autores: García-Valenzuela, Aurelio, Butterling, Maik, Liedke, Maciej O., Hirschmann, Eric, Trinh, T.T., Attallah, Ahmed G., Wagner, A., Álvarez, Rafael, Gil-Rostra, J., Rico, Víctor J., Palmero, Alberto, González-Elipe, Agustín R.
Tipo de recurso: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2020
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/216736
Acceso en línea:http://hdl.handle.net/10261/216736
Access Level:acceso abierto
Palabra clave:Positron annihilation
Micropores
OAD thin films
TiO2
SiO2
Growing mechanism
id ES_2b9ffcdddc0f165a2cea3ff11c4b15f3
oai_identifier_str oai:digital.csic.es:10261/216736
network_acronym_str ES
network_name_str España
repository_id_str
spelling Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayersGarcía-Valenzuela, AurelioButterling, MaikLiedke, Maciej O.Hirschmann, EricTrinh, T.T.Attallah, Ahmed G.Wagner, A.Álvarez, RafaelGil-Rostra, J.Rico, Víctor J.Palmero, AlbertoGonzález-Elipe, Agustín R.Positron annihilationMicroporesOAD thin filmsTiO2SiO2Growing mechanismThe nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis of porosity, defects and internal interfaces of materials, and has been applied to different as-deposited SiO and TiO thin films as well as SiO/TiO multilayers prepared by electron beam evaporation at 70° and 85° zenithal angles. It is shown that, under same deposition conditions, the concentration of internal nano-pores in SiO is higher than in TiO nanocolumns, while the situation is closer to this latter in TiO/SiO multilayers. These features have been compared with the predictions of a Monte Carlo simulation of the film growth and explained by considering the influence of the chemical composition on the growth mechanism and, ultimately, on the structure of the films.Elsevier BVConsejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]2020202020202020info:eu-repo/semantics/articlehttp://purl.org/coar/resource_type/c_6501Postprintinfo:eu-repo/semantics/acceptedVersionhttp://hdl.handle.net/10261/216736reponame:DIGITAL.CSIC. Repositorio Institucional del CSICinstname:Consejo Superior de Investigaciones Científicas (CSIC)Ingléshttp://dx.doi.org/10.1016/j.micromeso.2019.109968Síinfo:eu-repo/semantics/openAccessoai:digital.csic.es:10261/2167362026-05-22T06:33:51Z
dc.title.none.fl_str_mv Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
title Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
spellingShingle Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
García-Valenzuela, Aurelio
Positron annihilation
Micropores
OAD thin films
TiO2
SiO2
Growing mechanism
title_short Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
title_full Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
title_fullStr Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
title_full_unstemmed Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
title_sort Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers
dc.creator.none.fl_str_mv García-Valenzuela, Aurelio
Butterling, Maik
Liedke, Maciej O.
Hirschmann, Eric
Trinh, T.T.
Attallah, Ahmed G.
Wagner, A.
Álvarez, Rafael
Gil-Rostra, J.
Rico, Víctor J.
Palmero, Alberto
González-Elipe, Agustín R.
author García-Valenzuela, Aurelio
author_facet García-Valenzuela, Aurelio
Butterling, Maik
Liedke, Maciej O.
Hirschmann, Eric
Trinh, T.T.
Attallah, Ahmed G.
Wagner, A.
Álvarez, Rafael
Gil-Rostra, J.
Rico, Víctor J.
Palmero, Alberto
González-Elipe, Agustín R.
author_role author
author2 Butterling, Maik
Liedke, Maciej O.
Hirschmann, Eric
Trinh, T.T.
Attallah, Ahmed G.
Wagner, A.
Álvarez, Rafael
Gil-Rostra, J.
Rico, Víctor J.
Palmero, Alberto
González-Elipe, Agustín R.
author2_role author
author
author
author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Consejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]
dc.subject.none.fl_str_mv Positron annihilation
Micropores
OAD thin films
TiO2
SiO2
Growing mechanism
topic Positron annihilation
Micropores
OAD thin films
TiO2
SiO2
Growing mechanism
description The nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis of porosity, defects and internal interfaces of materials, and has been applied to different as-deposited SiO and TiO thin films as well as SiO/TiO multilayers prepared by electron beam evaporation at 70° and 85° zenithal angles. It is shown that, under same deposition conditions, the concentration of internal nano-pores in SiO is higher than in TiO nanocolumns, while the situation is closer to this latter in TiO/SiO multilayers. These features have been compared with the predictions of a Monte Carlo simulation of the film growth and explained by considering the influence of the chemical composition on the growth mechanism and, ultimately, on the structure of the films.
publishDate 2020
dc.date.none.fl_str_mv 2020
2020
2020
2020
dc.type.none.fl_str_mv info:eu-repo/semantics/article
http://purl.org/coar/resource_type/c_6501
Postprint
info:eu-repo/semantics/acceptedVersion
format article
status_str acceptedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/10261/216736
url http://hdl.handle.net/10261/216736
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv http://dx.doi.org/10.1016/j.micromeso.2019.109968
Sí
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv Elsevier BV
publisher.none.fl_str_mv Elsevier BV
dc.source.none.fl_str_mv reponame:DIGITAL.CSIC. Repositorio Institucional del CSIC
instname:Consejo Superior de Investigaciones Científicas (CSIC)
instname_str Consejo Superior de Investigaciones Científicas (CSIC)
reponame_str DIGITAL.CSIC. Repositorio Institucional del CSIC
collection DIGITAL.CSIC. Repositorio Institucional del CSIC
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869405165347405824
score 15.81155

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