Fabrication and replication of re-entrant structures by nanoimprint lithography methods

In this work, the authors present and demonstrate a simple method to fabricate and mass replicate re-entrant structures. The method consists of the direct imprinting of polymer mushroomlike microstructures produced by a combination of photolithography and nickel up-plating process. In particular, th...

Descripción completa

Detalles Bibliográficos
Autores: Kehagias, N., Francone, Achille, Guttmann, Markus, Winkler, Frank, Fernández, Ariadna, Sotomayor Torres, C. M.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2018
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/199193
Acceso en línea:http://hdl.handle.net/10261/199193
Access Level:acceso abierto
id ES_2a5d0d6f86038fd52c82bfbaec96e37e
oai_identifier_str oai:digital.csic.es:10261/199193
network_acronym_str ES
network_name_str España
repository_id_str
spelling Fabrication and replication of re-entrant structures by nanoimprint lithography methodsKehagias, N.Francone, AchilleGuttmann, MarkusWinkler, FrankFernández, AriadnaSotomayor Torres, C. M.In this work, the authors present and demonstrate a simple method to fabricate and mass replicate re-entrant structures. The method consists of the direct imprinting of polymer mushroomlike microstructures produced by a combination of photolithography and nickel up-plating process. In particular, they have studied the conditions to generate highly robust mushroomlike topographies and their topographical impact on the replication process. They discuss all the imprinting conditions suitable to replicate such topographies using both ultraviolet light assisted nanoimprint lithography (UV-NIL) and thermal NIL methods in two polymer films, poly(methyl methacrylate) and polypropylene, and a hybrid (organic–inorganic) UV light curable photoresist, namely, Ormocomp. Re-entrant topographies have been widely studied for liquid/oil repelling and dry adhesive properties, whereas in their experiments, they have proved evidence for their amphiphobic potential.The ICN2 is funded by the CERCA program/Generalitat de Catalunya. The ICN2 is supported by the Severo Ochoa program of the Spanish Ministry of Economy, Industry and Competitiveness (MINECO, Grant No. SEV-2013-0295) and the EU H2020 project NMBP-PILOT-2016-721062 (FLEXPOL).Peer reviewedAIP PublishingGeneralitat de CatalunyaMinisterio de Economía y Competitividad (España)European CommissionMinisterio de Economía, Industria y Competitividad (España)Consejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]202020202018info:eu-repo/semantics/articlehttp://purl.org/coar/resource_type/c_6501Publisher's versioninfo:eu-repo/semantics/publishedVersionhttp://hdl.handle.net/10261/199193reponame:DIGITAL.CSIC. Repositorio Institucional del CSICinstname:Consejo Superior de Investigaciones Científicas (CSIC)Inglés#PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE#info:eu-repo/grantAgreement/EC/H2020/721062info:eu-repo/grantAgreement/MINECO/Plan Estatal de Investigación Científica y Técnica y de Innovación 2013-2016/SEV-2013-0295https://doi.org/10.1116/1.5048241Síinfo:eu-repo/semantics/openAccessoai:digital.csic.es:10261/1991932026-05-22T06:33:51Z
dc.title.none.fl_str_mv Fabrication and replication of re-entrant structures by nanoimprint lithography methods
title Fabrication and replication of re-entrant structures by nanoimprint lithography methods
spellingShingle Fabrication and replication of re-entrant structures by nanoimprint lithography methods
Kehagias, N.
title_short Fabrication and replication of re-entrant structures by nanoimprint lithography methods
title_full Fabrication and replication of re-entrant structures by nanoimprint lithography methods
title_fullStr Fabrication and replication of re-entrant structures by nanoimprint lithography methods
title_full_unstemmed Fabrication and replication of re-entrant structures by nanoimprint lithography methods
title_sort Fabrication and replication of re-entrant structures by nanoimprint lithography methods
dc.creator.none.fl_str_mv Kehagias, N.
Francone, Achille
Guttmann, Markus
Winkler, Frank
Fernández, Ariadna
Sotomayor Torres, C. M.
author Kehagias, N.
author_facet Kehagias, N.
Francone, Achille
Guttmann, Markus
Winkler, Frank
Fernández, Ariadna
Sotomayor Torres, C. M.
author_role author
author2 Francone, Achille
Guttmann, Markus
Winkler, Frank
Fernández, Ariadna
Sotomayor Torres, C. M.
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Generalitat de Catalunya
Ministerio de Economía y Competitividad (España)
European Commission
Ministerio de Economía, Industria y Competitividad (España)
Consejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]
description In this work, the authors present and demonstrate a simple method to fabricate and mass replicate re-entrant structures. The method consists of the direct imprinting of polymer mushroomlike microstructures produced by a combination of photolithography and nickel up-plating process. In particular, they have studied the conditions to generate highly robust mushroomlike topographies and their topographical impact on the replication process. They discuss all the imprinting conditions suitable to replicate such topographies using both ultraviolet light assisted nanoimprint lithography (UV-NIL) and thermal NIL methods in two polymer films, poly(methyl methacrylate) and polypropylene, and a hybrid (organic–inorganic) UV light curable photoresist, namely, Ormocomp. Re-entrant topographies have been widely studied for liquid/oil repelling and dry adhesive properties, whereas in their experiments, they have proved evidence for their amphiphobic potential.
publishDate 2018
dc.date.none.fl_str_mv 2018
2020
2020
dc.type.none.fl_str_mv info:eu-repo/semantics/article
http://purl.org/coar/resource_type/c_6501
Publisher's version
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/10261/199193
url http://hdl.handle.net/10261/199193
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv #PLACEHOLDER_PARENT_METADATA_VALUE#
#PLACEHOLDER_PARENT_METADATA_VALUE#
info:eu-repo/grantAgreement/EC/H2020/721062
info:eu-repo/grantAgreement/MINECO/Plan Estatal de Investigación Científica y Técnica y de Innovación 2013-2016/SEV-2013-0295
https://doi.org/10.1116/1.5048241
Sí
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv AIP Publishing
publisher.none.fl_str_mv AIP Publishing
dc.source.none.fl_str_mv reponame:DIGITAL.CSIC. Repositorio Institucional del CSIC
instname:Consejo Superior de Investigaciones Científicas (CSIC)
instname_str Consejo Superior de Investigaciones Científicas (CSIC)
reponame_str DIGITAL.CSIC. Repositorio Institucional del CSIC
collection DIGITAL.CSIC. Repositorio Institucional del CSIC
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869405064152481792
score 15,198674

Similares en LA Referencia