Closed-loop compensation of charge trapping induced by ionizing radiation in MOS capacitors

The objective of this work is to explore the capability of a charge trapping control loop to continuously compensate charge induced by ionizing radiation in the dielectric of MOS capacitors. To this effect, two devices made with silicon oxide have been simultaneously irradiated with gamma radiation:...

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Detalhes bibliográficos
Autores: Domínguez Pumar, Manuel|||0000-0001-5439-7953, Bheesayagari, Chenna Reddy, Gorreta Mariné, Sergio, Lopez Chavez, G., Pons Nin, Joan|||0000-0002-0356-5678
Formato: artículo
Fecha de publicación:2017
País:España
Recursos:Universitat Politècnica de Catalunya (UPC)
Repositorio:UPCommons. Portal del coneixement obert de la UPC
Idioma:inglés
OAI Identifier:oai:upcommons.upc.edu:2117/108041
Acesso em linha:https://hdl.handle.net/2117/108041
https://dx.doi.org/10.1109/TIE.2017.2748033
Access Level:acceso abierto
Palavra-chave:Industrial electronics
Metal oxide semiconductors
Capacitance
Capacitance-voltage characteristics
Charge trapping control
CDielectrics
Ionizing radiation
MIS capacitors
Modulation
MOS capacitors
Radiation effects
Sigma-delta modulation
Electrònica industrial
Metall-òxid-semiconductors
Àrees temàtiques de la UPC::Física::Física de l'estat sòlid::Semiconductors
Descrição
Resumo:The objective of this work is to explore the capability of a charge trapping control loop to continuously compensate charge induced by ionizing radiation in the dielectric of MOS capacitors. To this effect, two devices made with silicon oxide have been simultaneously irradiated with gamma radiation: one with constant voltage bias, and the other working under a dielectric charge control. The experiment shows substantial charge trapping in the uncontrolled device whereas, at the same time, the control loop is able to compensate the charge induced by gamma radiation in the second device.