Monitoring of argon content in materials
It is reported the possibility of monitoring the presence of argon in the surface layer of materials using the fluorescent emission of characteristic K X-rays of argon by irradiation of the surface of the materials with low energy X-rays. The low energy of these characteristic X-rays, 2,97 keV, make...
| Autores: | , |
|---|---|
| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2013 |
| País: | Perú |
| Institución: | Universidad Nacional Mayor de San Marcos |
| Repositorio: | Revistas - Universidad Nacional Mayor de San Marcos |
| Idioma: | español |
| OAI Identifier: | oai:revistasinvestigacion.unmsm.edu.pe:article/8657 |
| Acceso en línea: | https://revistasinvestigacion.unmsm.edu.pe/index.php/fisica/article/view/8657 |
| Access Level: | acceso abierto |
| Palabra clave: | Monitoring argon X-ray fluorescence materials surface. Monitoreo argón fluorescencia de rayos X materiales superficie. |
| Sumario: | It is reported the possibility of monitoring the presence of argon in the surface layer of materials using the fluorescent emission of characteristic K X-rays of argon by irradiation of the surface of the materials with low energy X-rays. The low energy of these characteristic X-rays, 2,97 keV, makes possible to monitor the presence of argon down a depth of some five microns. |
|---|