Study on micromirrors

The aim of this project is to study micromirrors, this is to say their characteristics as well as their possible utilization. These micromirrors have been made using the silicon etching method with KOH:H2O (cf Optical Engineering/November 1994/Vol.33 No.11). A picture of one of this micromirror, see...

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Detalles Bibliográficos
Autor: FRANCISCO JAVIER RENERO CARRILLO
Tipo de recurso: informe técnico
Estado:Versión publicada
Fecha de publicación:2007
País:México
Institución:Instituto Nacional de Astrofísica, Óptica y Electrónica
Repositorio:Repositorio Institucional del INAOE
Idioma:inglés
OAI Identifier:oai:inaoe.repositorioinstitucional.mx:1009/1339
Acceso en línea:http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1339
Access Level:acceso abierto
Palabra clave:info:eu-repo/classification/cti/1
info:eu-repo/classification/cti/22
info:eu-repo/classification/cti/2209
Descripción
Sumario:The aim of this project is to study micromirrors, this is to say their characteristics as well as their possible utilization. These micromirrors have been made using the silicon etching method with KOH:H2O (cf Optical Engineering/November 1994/Vol.33 No.11). A picture of one of this micromirror, seen through an optical microscope, can be found in Appendix 1. The first chapters will present the characterisation of about 75 such micromirrors, classified in five different sizes (the sketches are given in Appendix 2). Different methods have been used to measure optical parameters, such as the diameter, the circularity, and the focal length, of the micromirrors. The consistence of the results will be studied, amongst each kind of samples as well as amongst the methods. In the last chapter, we will focus on the utilization of these micromirrors, especially for a “4f” system very used in telecommunications, and for a imagery “ended-ended” system.