Integration of MOSFET/MIM structures using a CMOS-based technology for pH detection applications with high-sensitivity
In this work, we show that by using Metal-Insulator-Metal (MIM) structures integrated in series to the gateof submicron Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) devices, highly-sensitive and ultra-lowpower consumption pH sensors can be obtained. One MIM capacitor enables external p...
| Autores: | , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión aceptada para publicación |
| Fecha de publicación: | 2012 |
| País: | México |
| Institución: | Instituto Nacional de Astrofísica, Óptica y Electrónica |
| Repositorio: | Repositorio Institucional del INAOE |
| Idioma: | inglés |
| OAI Identifier: | oai:inaoe.repositorioinstitucional.mx:1009/2068 |
| Acceso en línea: | http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/2068 |
| Access Level: | acceso abierto |
| Palabra clave: | info:eu-repo/classification/Inspec/ISFET info:eu-repo/classification/Inspec/MOSFET info:eu-repo/classification/Inspec/MIM capacitor info:eu-repo/classification/Inspec/Reference electrode info:eu-repo/classification/Inspec/pH detection info:eu-repo/classification/Inspec/Chemical sensor info:eu-repo/classification/Inspec/CMOS processing. info:eu-repo/classification/cti/1 info:eu-repo/classification/cti/22 info:eu-repo/classification/cti/2203 |
| Sumario: | In this work, we show that by using Metal-Insulator-Metal (MIM) structures integrated in series to the gateof submicron Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) devices, highly-sensitive and ultra-lowpower consumption pH sensors can be obtained. One MIM capacitor enables external polarization of the MOSFETdevice while a second MIM capacitor is connected to a sensing plate whose surface is whether a thick polyimidelayer or the last metallization level. The electrochemical response of these surfaces to pH buffer solutions resemblesthat of Ion-Sensitive Field-Effect Transistor (ISFET) devices whose pH sensitivity is dependent on the type of surfacematerial being exposed. |
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