Desarrollo de un sistema óptico simple con codificador del frente de onda para extender la profundidad de campo
Through the concept of the optical transfer function (OTF) the generalized pupil function of an imaging system is studied to comprehend the frequency respond of the system on the effect of misfocus. Then, this standard incoherent optical system is modified by placing a phase mask with a digital proc...
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| Tipo de recurso: | tesis de maestría |
| Estado: | Versión aceptada para publicación |
| Fecha de publicación: | 2012 |
| País: | México |
| Institución: | Instituto Nacional de Astrofísica, Óptica y Electrónica |
| Repositorio: | Repositorio Institucional del INAOE |
| Idioma: | español |
| OAI Identifier: | oai:inaoe.repositorioinstitucional.mx:1009/737 |
| Acceso en línea: | http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/737 |
| Access Level: | acceso abierto |
| Palabra clave: | info:eu-repo/classification/Imágenes/Imaging info:eu-repo/classification/Planos focales/Focal planes info:eu-repo/classification/Aberraciones/Aberrations info:eu-repo/classification/cti/1 info:eu-repo/classification/cti/22 info:eu-repo/classification/cti/2209 |
| Sumario: | Through the concept of the optical transfer function (OTF) the generalized pupil function of an imaging system is studied to comprehend the frequency respond of the system on the effect of misfocus. Then, this standard incoherent optical system is modified by placing a phase mask with a digital processing of the resulting intermediate image to deliver a near-diffraction-limited imaging performance with a large depth of field. For the phase mask design we use the ambiguity function to display the OTF for different values of misfocus and then select the ideal parameters for our imaging system with large depth of field. The phase mask alters or codes the received incoherent wave front in such a way that the point-spread function and the optical transfer function do not change appreciably as a function of misfocus. Two phase mask are presented: the cubic and the odd-symmetric quadratic, we test them to know their properties and characteristics. An analysis of their advantages and disadvantages is made to select one mask with the ideal parameters to be fabricated. |
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