Voids and nanopores in nanocolumnar platinum thin films grown by magnetron sputtering and evaporation at oblique angles: A comparative analysis
Nanocolumnar thin films deposited at oblique angle (OA) by magnetron sputtering or evaporation often show common structural aspects when grown under equivalent geometrical conditions. This is the case of the column tilt angle as a function of the geometrical deposition arrangement, which coincides f...
| Autores: | , , , , , , , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2025 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/393743 |
| Acceso en línea: | http://hdl.handle.net/10261/393743 https://api.elsevier.com/content/abstract/scopus_id/105005286489 |
| Access Level: | acceso abierto |
| Palabra clave: | Positron annihilation spectroscopy Evaporation Magnetron sputtering Nanocolumnar thin films Oblique angle deposition Porous thin films evaporation |
| Sumario: | Nanocolumnar thin films deposited at oblique angle (OA) by magnetron sputtering or evaporation often show common structural aspects when grown under equivalent geometrical conditions. This is the case of the column tilt angle as a function of the geometrical deposition arrangement, which coincides for some materials no matter the technique. This feature has usually been taken as a sign of a common type of growth, even though no other morphological aspects have been systematically compared. In this paper, a comparison between nanocolumnar Pt thin films grown at OA by evaporation and magnetron sputtering has been carried out, demonstrating the existence of profound differences in film density, columnar width or preferential crystalline texture, despite exhibiting the same nanocolumnar tilt. Moreover, the size distribution of voids and nanopores embedded in the nanocolumns has been specifically analyzed by means of two Positron Annihilation Spectroscopy techniques, demonstrating the existence of large variations depending on the preparation method. With the help of a growth model, these differences are discussed under the light of the atomistic processes present in evaporation and magnetron sputtering and, more specifically, on mobility processes triggered by the arrival of deposition atoms with relatively high kinetic energy. |
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