Transparent conducting thin films by the co-sputtering of ZnO-ITO targets

Transparent and conductive Zn-In-Sn-O (ZITO) amorphous thin films have been deposited at room temperature by the rf magnetron co-sputtering of ITO and ZnO targets. Co-sputtering gives the possibility to deposit multicomponent oxide thin films with different compositions by varying the power to one o...

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Detalhes bibliográficos
Autores: Carreras Seguí, Paz, Antony, Aldrin, Roldán Molinero, Rubén, Nos Aguilà, Oriol, Frigeri, Paolo Antonio, Asensi López, José Miguel, Bertomeu i Balagueró, Joan
Tipo de documento: artigo
Estado:Versión enviada para evaluación y publicación
Data de publicação:2010
País:España
Recursos:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Repositório:Recercat. Dipósit de la Recerca de Catalunya
OAI Identifier:oai:recercat.cat:2445/47147
Acesso em linha:https://hdl.handle.net/2445/47147
Access Level:Acceso aberto
Palavra-chave:Òxids metàl·lics
Semiconductors de gap ample
Pel·lícules fines
Cèl·lules solars
Optoelectrònica
Metallic oxides
Wide gap semiconductors
Thin films
Solar cells
Optoelectronics
Descrição
Resumo:Transparent and conductive Zn-In-Sn-O (ZITO) amorphous thin films have been deposited at room temperature by the rf magnetron co-sputtering of ITO and ZnO targets. Co-sputtering gives the possibility to deposit multicomponent oxide thin films with different compositions by varying the power to one of the targets. In order to make ZITO films with different Zn content, a constant rf power of 50 W was used for the ITO target, where as the rf power to ZnO target was varied from 25 W to 150 W. The as deposited films showed an increase in Zn content ratio from 17 to 67 % as the power to ZnO target was increased from 25 to 150 W. The structural, electrical and optical properties of the as deposited films are reported. The films showed an average transmittance over 80% in the visible wavelength range. The electrical resistivity and optical band gap of the ZITO films were found to depend on the Zn content in the film. The ZITO films deposited at room temperature with lower Zn content ratios showed better optical transmission and electrical properties compared to ITO film.