Comparison of Fin-Edge Roughness and Metal Grain Work Function Variability in InGaAs and Si FinFETs
The fin-edge roughness (FER) and the TiN metal grain work function (MGW)-induced variability affecting OFF and ON device characteristics are studied and compared between a 10.4-nm gate length In0.53Ga0.47As FinFET and a 10.7-nm gate length Si FinFET. We have analyzed the impact of variability by ass...
| Authors: | , , , , , , |
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| Format: | article |
| Publication Date: | 2016 |
| Country: | España |
| Institution: | Universidad de Santiago de Compostela (USC) |
| Repository: | Minerva. Repositorio Institucional de la Universidad de Santiago de Compostela |
| Language: | English |
| OAI Identifier: | oai:minerva.usc.gal:10347/38930 |
| Online Access: | https://hdl.handle.net/10347/38930 |
| Access Level: | Open access |
| Keyword: | III-V materials Fin-edge roughness (FER) FinFETs Gate work function variability Intrinsic parameter fluctuations Si 2203 Electrónica |
| Summary: | The fin-edge roughness (FER) and the TiN metal grain work function (MGW)-induced variability affecting OFF and ON device characteristics are studied and compared between a 10.4-nm gate length In0.53Ga0.47As FinFET and a 10.7-nm gate length Si FinFET. We have analyzed the impact of variability by assessing five figures of merit (threshold voltage, subthreshold slope, OFF-current, drain-induced-barrier-lowering, and ON-current) using the two state-of-the-art in-house-build 3-D simulation tools based on the finite-element method. Quantum-corrected 3-D drift-diffusion simulations are employed for variability studies in the subthreshold region while, in the ON-region, we use quantum-corrected 3-D ensemble Monte Carlo simulations. The In0.53Ga0.47As FinFET is more resilient to the FER and MGW variability in the subthreshold compared with the Si FinFET due to a stronger quantum carrier confinement present in the In0.53Ga0.47As channel. However, the ON-current variability is between 1.1 and 2.2 times larger for the In0.53Ga0.47As FinFET than for the Si counterpart, respectively. |
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