High reflectance ta-C coatings in the extreme ultraviolet

The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was si...

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Autores: Larruquert, Juan Ignacio, Rodríguez de Marcos, Luís, Méndez, José Antonio, Martín, P. J., Bendavid, A.
Tipo de recurso: artículo
Fecha de publicación:2013
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:dnet:digitalcsic_::349c5f821f8c2e3d527e0fdab8cbb413
Acceso en línea:http://hdl.handle.net/10261/91646
Access Level:acceso abierto
Palabra clave:Extreme
Ultraviolet
Optical constants
Thin films
Optical properties
Mirrors
Space optics
Free-electron lasers, FELs
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spelling High reflectance ta-C coatings in the extreme ultravioletLarruquert, Juan IgnacioRodríguez de Marcos, LuísMéndez, José AntonioMartín, P. J.Bendavid, A.ExtremeUltravioletOptical constantsThin filmsOptical propertiesMirrorsSpace opticsFree-electron lasers, FELsThe extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. © 2013 OSAThis work was partially supported by the National Programme for Space Research, Subdirección General de Proyectos de Investigación, Ministerio Economía y Competitividad, Project No. AYA2010-22032.Peer ReviewedOptical Society of America2014201420132014info:eu-repo/semantics/articlehttp://purl.org/coar/resource_type/c_6501http://hdl.handle.net/10261/91646reponame:DIGITAL.CSIC. Repositorio Institucional del CSICinstname:Consejo Superior de Investigaciones Científicas (CSIC)Inglésinfo:eu-repo/semantics/openAccessoai:dnet:digitalcsic_::349c5f821f8c2e3d527e0fdab8cbb4132026-05-22T06:33:51Z
dc.title.none.fl_str_mv High reflectance ta-C coatings in the extreme ultraviolet
title High reflectance ta-C coatings in the extreme ultraviolet
spellingShingle High reflectance ta-C coatings in the extreme ultraviolet
Larruquert, Juan Ignacio
Extreme
Ultraviolet
Optical constants
Thin films
Optical properties
Mirrors
Space optics
Free-electron lasers, FELs
title_short High reflectance ta-C coatings in the extreme ultraviolet
title_full High reflectance ta-C coatings in the extreme ultraviolet
title_fullStr High reflectance ta-C coatings in the extreme ultraviolet
title_full_unstemmed High reflectance ta-C coatings in the extreme ultraviolet
title_sort High reflectance ta-C coatings in the extreme ultraviolet
dc.creator.none.fl_str_mv Larruquert, Juan Ignacio
Rodríguez de Marcos, Luís
Méndez, José Antonio
Martín, P. J.
Bendavid, A.
author Larruquert, Juan Ignacio
author_facet Larruquert, Juan Ignacio
Rodríguez de Marcos, Luís
Méndez, José Antonio
Martín, P. J.
Bendavid, A.
author_role author
author2 Rodríguez de Marcos, Luís
Méndez, José Antonio
Martín, P. J.
Bendavid, A.
author2_role author
author
author
author
dc.subject.none.fl_str_mv Extreme
Ultraviolet
Optical constants
Thin films
Optical properties
Mirrors
Space optics
Free-electron lasers, FELs
topic Extreme
Ultraviolet
Optical constants
Thin films
Optical properties
Mirrors
Space optics
Free-electron lasers, FELs
description The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. © 2013 OSA
publishDate 2013
dc.date.none.fl_str_mv 2013
2014
2014
2014
dc.type.none.fl_str_mv info:eu-repo/semantics/article
http://purl.org/coar/resource_type/c_6501
format article
dc.identifier.none.fl_str_mv http://hdl.handle.net/10261/91646
url http://hdl.handle.net/10261/91646
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv Optical Society of America
publisher.none.fl_str_mv Optical Society of America
dc.source.none.fl_str_mv reponame:DIGITAL.CSIC. Repositorio Institucional del CSIC
instname:Consejo Superior de Investigaciones Científicas (CSIC)
instname_str Consejo Superior de Investigaciones Científicas (CSIC)
reponame_str DIGITAL.CSIC. Repositorio Institucional del CSIC
collection DIGITAL.CSIC. Repositorio Institucional del CSIC
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869421150255185920
score 15,198674

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