Recubrimientos ópticos en el rango espectral entre 50 y 200 nm

The development of efficient optical coatings in the spectral region between 50 and 200 nm (EUV-FUV) is an important challenge due to the great absortion and low reflectance that most of the materials present in this region. In addition, these coatings are an important element in the advance of many...

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Detalles Bibliográficos
Autores: Fernández-Perea, Mónica, Méndez, José Antonio, Larruquert, Juan Ignacio, Aznárez, José Antonio
Tipo de recurso: artículo
Fecha de publicación:2006
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/2677
Acceso en línea:http://hdl.handle.net/10261/2677
Access Level:acceso abierto
Palabra clave:Optical coatings
Extreme ultraviolet
Far ultraviolet
Thin films
Reflectometry
Descripción
Sumario:The development of efficient optical coatings in the spectral region between 50 and 200 nm (EUV-FUV) is an important challenge due to the great absortion and low reflectance that most of the materials present in this region. In addition, these coatings are an important element in the advance of many fields like astronomical abservations, plasma diagnosis and lithography. In this work we describe some of the optical coatings developed by the Research Group in Thin Film Coatings (GOLD), which operate in the EUV-FUV region of the spectrum. In GOLD we have an ultra high vacuum experimental system that permits the deposition and in situ measurement of the transmittance and reflectance of multilayers, as a function of the angle of incidence, and in the EUV-FUV spectral range. We prepare multilayers with up to six different materials, which can be deposited using three different techniques. In situ transmittance and reflectance measurements versus the angle of incidence permits the determination of the optical constants (n,k) of the materials, without being exposed to the atmosphere. Due to the great dependance between the optical properties of thin film layers in this spectral range, and the exposition to the atmosphere, our experimental system is a very adequate tool for the determination of those properties, and therefore for the design and fabrication of novel multilayers.