Sub-bandgap spectral photo-response analysis of Ti supersaturated Si

We have analyzed the increase of the sheet conductance (Delta G(square)) under spectral illumination in high dose Ti implanted Si samples subsequently processed by pulsed-laser melting. Samples with Ti concentration clearly above the insulator-metal transition limit show a remarkably high Delta G(sq...

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Detalles Bibliográficos
Autores: Martil De La Plaza, Ignacio, García Hemme, Eric, García Hernansanz, Rodrigo, González Díaz, Germán, Olea Ariza, Javier, Prado Millán, Álvaro Del
Tipo de recurso: artículo
Fecha de publicación:2012
País:España
Institución:Universidad Complutense de Madrid (UCM)
Repositorio:Docta Complutense
Idioma:inglés
OAI Identifier:oai:docta.ucm.es:20.500.14352/44230
Acceso en línea:https://hdl.handle.net/20.500.14352/44230
Access Level:acceso abierto
Palabra clave:537
Solar-Cells
Semiconductors.
Electricidad
Electrónica (Física)
2202.03 Electricidad
Descripción
Sumario:We have analyzed the increase of the sheet conductance (Delta G(square)) under spectral illumination in high dose Ti implanted Si samples subsequently processed by pulsed-laser melting. Samples with Ti concentration clearly above the insulator-metal transition limit show a remarkably high Delta G(square), even higher than that measured in a silicon reference sample. This increase in the Delta G(square) magnitude is contrary to the classic understanding of recombination centers action and supports the lifetime recovery predicted for concentrations of deep levels above the insulator-metal transition.