CoFe2O4/buffer layer ultrathin heterostructures on Si(001)

Epitaxial films of ferromagnetic CoFe2O4 (CFO) were grown by pulsed laser deposition on Si(001) buffered with ultrathin yttria-stabilized zirconia (YSZ) layers in a single process. Reflection high-energy electron diffraction was used to monitor in real time the crystallization of YSZ, allowing the f...

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Detalhes bibliográficos
Autores: Bachelet, Romain, Coux, P. de, Warot-Fonrose, Bénédicte, Skumryev, Vassil Hristov|||0000-0003-1375-4824, Sánchez Barrera, Florencio|||0000-0002-5314-453X, Fontcuberta, Josep|||0000-0002-7955-2320
Formato: artículo
Fecha de publicación:2011
País:España
Recursos:Universitat Autònoma de Barcelona
Repositorio:Dipòsit Digital de Documents de la UAB
Idioma:inglés
OAI Identifier:oai:ddd.uab.cat:107299
Acesso em linha:https://ddd.uab.cat/record/107299
https://dx.doi.org/urn:doi:10.1063/1.3651386
Access Level:acceso abierto
Palavra-chave:Pel·lícules fines
Descrição
Resumo:Epitaxial films of ferromagnetic CoFe2O4 (CFO) were grown by pulsed laser deposition on Si(001) buffered with ultrathin yttria-stabilized zirconia (YSZ) layers in a single process. Reflection high-energy electron diffraction was used to monitor in real time the crystallization of YSZ, allowing the fabrication of epitaxial YSZ buffers with thickness of about 2 nm. CFO films, with thicknesses in the 2-50 nm range were subsequently deposited. The magnetization of the CFO films is close to the bulk value. The ultrathin CFO/YSZ heterostructures have very flat morphology (0.1 nm roughness) and thin interfacial SiOx layer (about 2 nm thick) making them suitable for integration in tunnel (e.g., spin injection) devices.