Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

The development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such as tribology, optics or microelectronics. In this paper we investigate the dep...

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Authors: Vergara, Lucía, Escobar-Galindo, Ramón, Martínez, R., Sánchez, Olga, Palacio Orcajo, Carlos, Albella Martín, José María
Format: article
Status:Published version
Publication Date:2011
Country:España
Institution:Universidad de Sevilla (US)
Repository:idUS. Depósito de Investigación de la Universidad de Sevilla
OAI Identifier:oai:idus.us.es:11441/147415
Online Access:https://hdl.handle.net/11441/147415
https://doi.org/10.1016/j.tsf.2011.01.103
Access Level:Open access
Keyword:Reactive magnetron sputtering
Mixed oxides
Optical properties
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spelling Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputteringVergara, LucíaEscobar-Galindo, RamónMartínez, R.Sánchez, OlgaPalacio Orcajo, CarlosAlbella Martín, José MaríaReactive magnetron sputteringMixed oxidesOptical propertiesThe development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such as tribology, optics or microelectronics. In this paper we investigate the deposition of mixed chromium and silicon oxides deposited by reactive magnetron sputtering with a view to use them as optical coatings with an adjustable refractive index. These films have been characterized by means of Rutherford backscattering spectrometry, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy, Fourier-transform infrared spectroscopy and spectroscopic ellipsometry so as to determine how the deposition conditions influence the characteristics of the material. We have found that the deposition parameter whose influence determines the properties of the films to a greater extent is the amount of oxygen in the reactive sputtering gas.Ministerio de Ciencia e Innovación CSD2008-00023 (CONSOLIDER-Ingenio 2010)Ministerio de Ciencia e Innovación MAT2008-06618-C02-02/MATMinisterio de Ciencia e Innovación RyC2007-0026ScienceDirectFísica Aplicada IMinisterio de Ciencia e Innovación (MICIN). España2011info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/147415https://doi.org/10.1016/j.tsf.2011.01.103reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésThin Solid Films, 519 (11), 3509-3515.CSD2008-00023 (CONSOLIDER-Ingenio 2010)MAT2008-06618-C02-02/MATRyC2007-0026https://www.sciencedirect.com/science/article/pii/S0040609011001465info:eu-repo/semantics/openAccessoai:idus.us.es:11441/1474152026-06-17T12:51:07Z
dc.title.none.fl_str_mv Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
title Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
spellingShingle Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
Vergara, Lucía
Reactive magnetron sputtering
Mixed oxides
Optical properties
title_short Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
title_full Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
title_fullStr Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
title_full_unstemmed Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
title_sort Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
dc.creator.none.fl_str_mv Vergara, Lucía
Escobar-Galindo, Ramón
Martínez, R.
Sánchez, Olga
Palacio Orcajo, Carlos
Albella Martín, José María
author Vergara, Lucía
author_facet Vergara, Lucía
Escobar-Galindo, Ramón
Martínez, R.
Sánchez, Olga
Palacio Orcajo, Carlos
Albella Martín, José María
author_role author
author2 Escobar-Galindo, Ramón
Martínez, R.
Sánchez, Olga
Palacio Orcajo, Carlos
Albella Martín, José María
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Física Aplicada I
Ministerio de Ciencia e Innovación (MICIN). España
dc.subject.none.fl_str_mv Reactive magnetron sputtering
Mixed oxides
Optical properties
topic Reactive magnetron sputtering
Mixed oxides
Optical properties
description The development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such as tribology, optics or microelectronics. In this paper we investigate the deposition of mixed chromium and silicon oxides deposited by reactive magnetron sputtering with a view to use them as optical coatings with an adjustable refractive index. These films have been characterized by means of Rutherford backscattering spectrometry, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy, Fourier-transform infrared spectroscopy and spectroscopic ellipsometry so as to determine how the deposition conditions influence the characteristics of the material. We have found that the deposition parameter whose influence determines the properties of the films to a greater extent is the amount of oxygen in the reactive sputtering gas.
publishDate 2011
dc.date.none.fl_str_mv 2011
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/11441/147415
https://doi.org/10.1016/j.tsf.2011.01.103
url https://hdl.handle.net/11441/147415
https://doi.org/10.1016/j.tsf.2011.01.103
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Thin Solid Films, 519 (11), 3509-3515.
CSD2008-00023 (CONSOLIDER-Ingenio 2010)
MAT2008-06618-C02-02/MAT
RyC2007-0026
https://www.sciencedirect.com/science/article/pii/S0040609011001465
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv ScienceDirect
publisher.none.fl_str_mv ScienceDirect
dc.source.none.fl_str_mv reponame:idUS. Depósito de Investigación de la Universidad de Sevilla
instname:Universidad de Sevilla (US)
instname_str Universidad de Sevilla (US)
reponame_str idUS. Depósito de Investigación de la Universidad de Sevilla
collection idUS. Depósito de Investigación de la Universidad de Sevilla
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15.300719

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