Electrical transport quantum effects in the In0.53Ga0.47As/In0.52Al0.48As heterostructure on silicon

Electrical transport in a modulation doped heterostructure of In0.53Ga0.47As/In0.52Al0.48As grown on Si by molecular beam epitaxy has been measured. Quantum Hall effect and Subnikov¿De Haas oscillations were observed indicating the two¿dimensional character of electron transport. A mobility of 20¿00...

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Detalhes bibliográficos
Autores: Georgakilas, Alexander, Christou, Aris, Zekentes, Konstantinos, Mercy, J. M., Konczewic, L. K., Vilà i Arbonès, Anna Maria, Cornet i Calveras, Albert
Formato: artículo
Estado:Versión publicada
Fecha de publicación:1994
País:España
Recursos:Universidad de Barcelona
Repositorio:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/24723
Acesso em linha:https://hdl.handle.net/2445/24723
Access Level:acceso abierto
Palavra-chave:Camps magnètics
Nanotecnologia
Magnetic fields
Nanotechnology
Descrição
Resumo:Electrical transport in a modulation doped heterostructure of In0.53Ga0.47As/In0.52Al0.48As grown on Si by molecular beam epitaxy has been measured. Quantum Hall effect and Subnikov¿De Haas oscillations were observed indicating the two¿dimensional character of electron transport. A mobility of 20¿000 cm2/V¿s was measured at 6 K for an electron sheet concentration of 1.7×1012 cm¿2. Transmission electron microscopy observations indicated a significant surface roughness and high defect density of the InGaAs/InAlAs layers to be present due to the growth on silicon. In addition, fine¿scale composition modulation present in the In0.53Ga0.47As/In0.52Al0.48As may further limit transport properties.