Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, fro...
| Autores: | , , , , , , |
|---|---|
| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2014 |
| País: | España |
| Institución: | Universidad Pública de Navarra |
| Repositorio: | Academica-e. Repositorio Institucional de la Universidad Pública de Navarra |
| OAI Identifier: | oai:academica-e.unavarra.es:2454/20888 |
| Acceso en línea: | https://hdl.handle.net/2454/20888 |
| Access Level: | acceso abierto |
| Palabra clave: | Nanostructures Antireflectivity Silicon |
| Sumario: | In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. |
|---|