Elastic tunneling charge transport mechanisms in silicon quantum dots / SiO2 thin films and superlattices
The role of different charge transport mechanisms in Si /SiO2 structures has been studied. A theoretical model based on the Transfer Hamiltonian Formalism has been developed to explain experimental current trends in terms of three different elastic tunneling processes: (1) trap assisted tunneling; (...
| Autores: | , , |
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| Formato: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2015 |
| País: | España |
| Recursos: | Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya) |
| Repositorio: | Recercat. Dipósit de la Recerca de Catalunya |
| OAI Identifier: | oai:recercat.cat:2445/98752 |
| Acesso em linha: | https://hdl.handle.net/2445/98752 |
| Access Level: | acceso abierto |
| Palavra-chave: | Semiconductors Teoria quàntica Nanocristalls Silici Quantum theory Nanocrystals Silicon |
| Resumo: | The role of different charge transport mechanisms in Si /SiO2 structures has been studied. A theoretical model based on the Transfer Hamiltonian Formalism has been developed to explain experimental current trends in terms of three different elastic tunneling processes: (1) trap assisted tunneling; (2) transport through an intermediate quantum dot; and (3) direct tunneling between leads. In general, at low fields carrier transport is dominated by the quantum dots whereas, for moderate and high fields, transport through deep traps inherent to the SiO 2 is the most relevant process. Besides, current trends in Si /SiO2 superlattice structure have been properly reproduced. |
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