Effect of CdSe nanoparticle addition on nanostructuring of PS-b-P4VP copolymer via solvent vapour exposure
The surface morphology of poly(styrene-b-4 vinyl pyridine) (PS-b-P4VP) diblock copolymer thin films after solvent vapor annealing has been studied. Morphological features can be switched upon exposure to vapors of a solvent selective for one of the blocks. Self-assembled nanostructures such as hexag...
| Autores: | , , , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 2013 |
| País: | España |
| Institución: | Universidad del País Vasco |
| Repositorio: | Addi. Archivo Digital para la Docencia y la Investigación |
| OAI Identifier: | oai:addi.ehu.eus:10810/65987 |
| Acceso en línea: | http://hdl.handle.net/10810/65987 |
| Access Level: | acceso abierto |
| Palabra clave: | CdSe nanoparticles PS-P4VP solvent annealing |
| Sumario: | The surface morphology of poly(styrene-b-4 vinyl pyridine) (PS-b-P4VP) diblock copolymer thin films after solvent vapor annealing has been studied. Morphological features can be switched upon exposure to vapors of a solvent selective for one of the blocks. Self-assembled nanostructures such as hexagonal or striped morphologies were obtained varying vapor exposure time. In addition, the effect of the presence of CdSe nanoparticles located in the P4VP block on obtained nanostructures was analyzed. Atomic force microscopy (AFM) was used for morphological characterization of the block copolymer and the nanocomposites. AFM images showed that nanostructuring was different depending on the amount of CdSe nanoparticles, due to the decrease in P4VP chain mobility. |
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