High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL

Detalles Bibliográficos
Autores: Tramarin, Luca|||0000-0001-5801-8658, Casquel del Campo, Rafael|||0000-0003-2433-9159, Mañueco Rubio, Iñigo, Holgado Bolaños, Miguel|||0000-0001-9299-1371
Tipo de recurso: artículo
Fecha de publicación:2023
País:España
Institución:Universidad Politécnica de Madrid
Repositorio:Archivo Digital UPM
OAI Identifier:oai:oa.upm.es:94420
Acceso en línea:https://oa.upm.es/94420/
Access Level:acceso abierto
Palabra clave:arrays
Degradation
IMPRINT
MOLD RELEASE
Nanoholes
Nanopillars
Performance
RNPs
Soft UV-NIL
UV-PDMS
NANOHOLES
nanopillars
NIL
Silicon Dioxide
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oai_identifier_str oai:oa.upm.es:94420
network_acronym_str ES
network_name_str España
repository_id_str
spelling High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NILTramarin, Luca|||0000-0001-5801-8658Casquel del Campo, Rafael|||0000-0003-2433-9159Mañueco Rubio, IñigoHolgado Bolaños, Miguel|||0000-0001-9299-1371arraysDegradationIMPRINTMOLD RELEASENanoholesNanopillarsPerformanceRNPsSoft UV-NILUV-PDMSNANOHOLESnanopillarsNILRNPsSilicon DioxideSoft UV-NILUV-PDMS20232023-10-15journal articlehttp://purl.org/coar/resource_type/c_6501info:eu-repo/semantics/articlehttps://oa.upm.es/94420/reponame:Archivo Digital UPMinstname:Universidad Politécnica de MadridInglésenopen accesshttp://purl.org/coar/access_right/c_abf2info:eu-repo/semantics/openAccessoai:oa.upm.es:944202026-06-21T12:45:07Z
dc.title.none.fl_str_mv High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
title High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
spellingShingle High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
Tramarin, Luca|||0000-0001-5801-8658
arrays
Degradation
IMPRINT
MOLD RELEASE
Nanoholes
Nanopillars
Performance
RNPs
Soft UV-NIL
UV-PDMS
NANOHOLES
nanopillars
NIL
RNPs
Silicon Dioxide
Soft UV-NIL
UV-PDMS
title_short High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
title_full High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
title_fullStr High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
title_full_unstemmed High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
title_sort High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
dc.creator.none.fl_str_mv Tramarin, Luca|||0000-0001-5801-8658
Casquel del Campo, Rafael|||0000-0003-2433-9159
Mañueco Rubio, Iñigo
Holgado Bolaños, Miguel|||0000-0001-9299-1371
author Tramarin, Luca|||0000-0001-5801-8658
author_facet Tramarin, Luca|||0000-0001-5801-8658
Casquel del Campo, Rafael|||0000-0003-2433-9159
Mañueco Rubio, Iñigo
Holgado Bolaños, Miguel|||0000-0001-9299-1371
author_role author
author2 Casquel del Campo, Rafael|||0000-0003-2433-9159
Mañueco Rubio, Iñigo
Holgado Bolaños, Miguel|||0000-0001-9299-1371
author2_role author
author
author
dc.subject.none.fl_str_mv arrays
Degradation
IMPRINT
MOLD RELEASE
Nanoholes
Nanopillars
Performance
RNPs
Soft UV-NIL
UV-PDMS
NANOHOLES
nanopillars
NIL
RNPs
Silicon Dioxide
Soft UV-NIL
UV-PDMS
topic arrays
Degradation
IMPRINT
MOLD RELEASE
Nanoholes
Nanopillars
Performance
RNPs
Soft UV-NIL
UV-PDMS
NANOHOLES
nanopillars
NIL
RNPs
Silicon Dioxide
Soft UV-NIL
UV-PDMS
publishDate 2023
dc.date.none.fl_str_mv 2023
2023-10-15
dc.type.none.fl_str_mv journal article
http://purl.org/coar/resource_type/c_6501
dc.type.openaire.fl_str_mv info:eu-repo/semantics/article
format article
dc.identifier.none.fl_str_mv https://oa.upm.es/94420/
url https://oa.upm.es/94420/
dc.language.none.fl_str_mv Inglés
en
language_invalid_str_mv Inglés
en
dc.rights.none.fl_str_mv open access
http://purl.org/coar/access_right/c_abf2
dc.rights.openaire.fl_str_mv info:eu-repo/semantics/openAccess
rights_invalid_str_mv open access
http://purl.org/coar/access_right/c_abf2
eu_rights_str_mv openAccess
dc.source.none.fl_str_mv reponame:Archivo Digital UPM
instname:Universidad Politécnica de Madrid
instname_str Universidad Politécnica de Madrid
reponame_str Archivo Digital UPM
collection Archivo Digital UPM
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869415869282516992
score 15,811543

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