Thin film nanostructuring at oblique angles by substrate patterning

Muñoz-Piña, Sandra; Márquez Alcaide, Antonio José; Limones-Ahijón, Blanca; Oliva Ramirez, Manuel; Rico-Gavira, Víctor Joaquín; Alcalá Penadés, Germán; González Sagardoy, Maria Ujué; García-Martín, José Miguel; Álvarez Molina, Rafael; Wang, Dong; Schaaf, Peter; Rodríguez González-Elipe, Agustín; Palmero Acebedo, Alberto

Thin film nanostructuring at oblique angles by substrate patterning

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagona...

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Autores:	Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramirez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto
Tipo de recurso:	artículo
Estado:	Versión publicada
Fecha de publicación:	2022
País:	España
Institución:	Universidad de Sevilla (US)
Repositorio:	idUS. Depósito de Investigación de la Universidad de Sevilla
OAI Identifier:	oai:idus.us.es:11441/131013
Acceso en línea:	https://hdl.handle.net/11441/131013 https://doi.org/10.1016/j.surfcoat.2022.128293
Access Level:	acceso abierto
Palabra clave:	Magnetron sputtering Nanostructured thin films Substrate patterning Oblique angle deposition Porous thin films

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spelling	Thin film nanostructuring at oblique angles by substrate patterningMuñoz-Piña, SandraMárquez Alcaide, Antonio JoséLimones-Ahijón, BlancaOliva Ramirez, ManuelRico-Gavira, Víctor JoaquínAlcalá Penadés, GermánGonzález Sagardoy, Maria UjuéGarcía-Martín, José MiguelÁlvarez Molina, RafaelWang, DongSchaaf, PeterRodríguez González-Elipe, AgustínPalmero Acebedo, AlbertoMagnetron sputteringNanostructured thin filmsSubstrate patterningOblique angle depositionPorous thin filmsIt is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.MCIN/AEI/and FEDER project PID2019-110430GB-C21MCIN/AEI/ and FEDER project PID2020-112620GB-I00MCIN/AEI/ and FEDER project PID2020-114270RA-I00MCIN/AEI/ and FEDER project RTI2018-098117-B-C21Junta de Andalucía PAIDI-2020 project P18-RT-3480Junta de Andalucía PAIDI-2020 project P18-RT-6079University of Seville VI PPIT-USElsevierFísica Aplicada IQuímica InorgánicaFQM196: Nanotecnología en Superficies y Plasma2022info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/131013https://doi.org/10.1016/j.surfcoat.2022.128293reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésSurface and Coatings Technology, 436, 128293PID2019-110430GB-C21PID2020-112620GB-I00PID2020-114270RA-I00RTI2018-098117-B-C21P18-RT-3480P18-RT-6079https://www.sciencedirect.com/science/article/pii/S0257897222002146#!info:eu-repo/semantics/openAccessoai:idus.us.es:11441/1310132026-06-17T12:51:07Z
dc.title.none.fl_str_mv	Thin film nanostructuring at oblique angles by substrate patterning
title	Thin film nanostructuring at oblique angles by substrate patterning
spellingShingle	Thin film nanostructuring at oblique angles by substrate patterning Muñoz-Piña, Sandra Magnetron sputtering Nanostructured thin films Substrate patterning Oblique angle deposition Porous thin films
title_short	Thin film nanostructuring at oblique angles by substrate patterning
title_full	Thin film nanostructuring at oblique angles by substrate patterning
title_fullStr	Thin film nanostructuring at oblique angles by substrate patterning
title_full_unstemmed	Thin film nanostructuring at oblique angles by substrate patterning
title_sort	Thin film nanostructuring at oblique angles by substrate patterning
dc.creator.none.fl_str_mv	Muñoz-Piña, Sandra Márquez Alcaide, Antonio José Limones-Ahijón, Blanca Oliva Ramirez, Manuel Rico-Gavira, Víctor Joaquín Alcalá Penadés, Germán González Sagardoy, Maria Ujué García-Martín, José Miguel Álvarez Molina, Rafael Wang, Dong Schaaf, Peter Rodríguez González-Elipe, Agustín Palmero Acebedo, Alberto
author	Muñoz-Piña, Sandra
author_facet	Muñoz-Piña, Sandra Márquez Alcaide, Antonio José Limones-Ahijón, Blanca Oliva Ramirez, Manuel Rico-Gavira, Víctor Joaquín Alcalá Penadés, Germán González Sagardoy, Maria Ujué García-Martín, José Miguel Álvarez Molina, Rafael Wang, Dong Schaaf, Peter Rodríguez González-Elipe, Agustín Palmero Acebedo, Alberto
author_role	author
author2	Márquez Alcaide, Antonio José Limones-Ahijón, Blanca Oliva Ramirez, Manuel Rico-Gavira, Víctor Joaquín Alcalá Penadés, Germán González Sagardoy, Maria Ujué García-Martín, José Miguel Álvarez Molina, Rafael Wang, Dong Schaaf, Peter Rodríguez González-Elipe, Agustín Palmero Acebedo, Alberto
author2_role	author author author author author author author author author author author author
dc.contributor.none.fl_str_mv	Física Aplicada I Química Inorgánica FQM196: Nanotecnología en Superficies y Plasma
dc.subject.none.fl_str_mv	Magnetron sputtering Nanostructured thin films Substrate patterning Oblique angle deposition Porous thin films
topic	Magnetron sputtering Nanostructured thin films Substrate patterning Oblique angle deposition Porous thin films
description	It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.
publishDate	2022
dc.date.none.fl_str_mv	2022
dc.type.none.fl_str_mv	info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion
format	article
status_str	publishedVersion
dc.identifier.none.fl_str_mv	https://hdl.handle.net/11441/131013 https://doi.org/10.1016/j.surfcoat.2022.128293
url	https://hdl.handle.net/11441/131013 https://doi.org/10.1016/j.surfcoat.2022.128293
dc.language.none.fl_str_mv	Inglés
language_invalid_str_mv	Inglés
dc.relation.none.fl_str_mv	Surface and Coatings Technology, 436, 128293 PID2019-110430GB-C21 PID2020-112620GB-I00 PID2020-114270RA-I00 RTI2018-098117-B-C21 P18-RT-3480 P18-RT-6079 https://www.sciencedirect.com/science/article/pii/S0257897222002146#!
dc.rights.none.fl_str_mv	info:eu-repo/semantics/openAccess
eu_rights_str_mv	openAccess
dc.format.none.fl_str_mv	application/pdf application/pdf
dc.publisher.none.fl_str_mv	Elsevier
publisher.none.fl_str_mv	Elsevier
dc.source.none.fl_str_mv	reponame:idUS. Depósito de Investigación de la Universidad de Sevilla instname:Universidad de Sevilla (US)
instname_str	Universidad de Sevilla (US)
reponame_str	idUS. Depósito de Investigación de la Universidad de Sevilla
collection	idUS. Depósito de Investigación de la Universidad de Sevilla
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score	15.300724

Thin film nanostructuring at oblique angles by substrate patterning

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