TCO-free low-temperature p+ emitters for back-junction c-Si solar cells

In this work, we report on the fabrication and characterization of n-type c-Si solar cells whose p+ emitters are based on laser processed aluminum oxide/silicon carbide (Al2O3/SiCx) films. The p+ emitter is defined at the rear side of the cell and it consists of point-like laser-diffused p+ regions...

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Detalles Bibliográficos
Autores: Martín García, Isidro|||0000-0001-8833-9057, Coll Valentí, Arnau|||0000-0001-6380-7475, López Rodríguez, Gema|||0000-0003-4806-5180, Ortega Villasclaras, Pablo Rafael|||0000-0001-6577-614X, Desrues, Thibaut, Orpella García, Alberto|||0000-0003-2726-5861, Alcubilla González, Ramón|||0000-0003-4827-4513
Tipo de recurso: artículo
Fecha de publicación:2015
País:España
Institución:Universitat Politècnica de Catalunya (UPC)
Repositorio:UPCommons. Portal del coneixement obert de la UPC
Idioma:inglés
OAI Identifier:oai:upcommons.upc.edu:2117/175404
Acceso en línea:https://hdl.handle.net/2117/175404
https://dx.doi.org/10.1016/j.egypro.2015.07.042
Access Level:acceso abierto
Palabra clave:Solar cells
DopLa cell
Laser doping
Back-junction
c-Si solar cells
Cèl·lules solars
Àrees temàtiques de la UPC::Energies::Energia solar fotovoltaica::Cèl·lules solars
Descripción
Sumario:In this work, we report on the fabrication and characterization of n-type c-Si solar cells whose p+ emitters are based on laser processed aluminum oxide/silicon carbide (Al2O3/SiCx) films. The p+ emitter is defined at the rear side of the cell and it consists of point-like laser-diffused p+ regions with a surface charge induced emitter in between based on the high negative charge located at the Al2O3/c-Si interface. These emitters are fabricated at low temperature (< 400 °C) and could be directly compared to silicon heterojunction emitters with the advantage that the deposition of a Transparent Conductive Oxide (TCO) film can be avoided, since they are based on p+/n c-Si homojunctions. Additionally, the involved films are transparent to the IR photons ( >1000 nm) that reach the rear surface of the cell resulting in an excellent back reflector. We fabricated solar cells with distance between p+ regions or pitch ranging from 200 to 350 µm with a front surface based on silicon heterojunction technology. Best efficiency (18.1%) is obtained for a pitch of 250 µm as a consequence of the trade-off between Voc and FF values.