2D compositional self-patterning in magnetron sputtered thin films

Unlike topography patterning, widely used for numerous applications and produced by means of different technologies, there are no simple procedures to achieve surface compositional patterning at nanometric scales. In this work we have developed a simple method for 2D patterning the composition of th...

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Autores: García Valenzuela, Aurelio, Álvarez Molina, Rafael, Rico, Víctor, Espinós Manzano, Juan Pedro, López Santos, Carmen, Solís, Javier, Siegel, Jan, Campo, Adolfo del, Palmero Acebedo, Alberto, Rodríguez González-Elipe, Agustín
Tipo de recurso: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2019
País:España
Institución:Universidad de Sevilla (US)
Repositorio:idUS. Depósito de Investigación de la Universidad de Sevilla
OAI Identifier:oai:idus.us.es:11441/160667
Acceso en línea:https://hdl.handle.net/11441/160667
https://doi.org/10.1016/j.apsusc.2019.02.206
Access Level:acceso abierto
Palabra clave:Angle resolved XPS
Compositional patterning
LIPPS
Magnetron sputtering
SiOx thin films
Surface composition
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spelling 2D compositional self-patterning in magnetron sputtered thin filmsGarcía Valenzuela, AurelioÁlvarez Molina, RafaelRico, VíctorEspinós Manzano, Juan PedroLópez Santos, CarmenSolís, JavierSiegel, JanCampo, Adolfo delPalmero Acebedo, Alberto Rodríguez González-Elipe, AgustínAngle resolved XPSCompositional patterningLIPPSMagnetron sputteringSiOx thin filmsSurface compositionUnlike topography patterning, widely used for numerous applications and produced by means of different technologies, there are no simple procedures to achieve surface compositional patterning at nanometric scales. In this work we have developed a simple method for 2D patterning the composition of thin films. The method relies on the magnetron sputtering deposition at oblique angles onto patterned substrates made by laser induced periodic surface structures (LIPSS). The method feasibility has been demonstrated by depositing SiOx thin films onto LIPSS structures generated in Cr layers. A heterogeneous and aligned distribution of O/Si ratios (and different Si n+ chemical states) along the LIPSS structure in length scales of some hundreds nm's has been proven by angle resolved X-ray photoelectron spectroscopy and a patterned arrangement of composition monitored by atomic force microscopy-Raman analysis. The obtained results are explained by the predictions of a Monte Carlo simulation of this deposition process and open the way for the tailored one-step fabrication of surface devices with patterned compositions.Elsevier B.V.Física Aplicada IEuropean Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER)Ministerio de Economia, Industria y Competitividad (MINEICO). EspañaUniversidad de Sevilla2019info:eu-repo/semantics/articleinfo:eu-repo/semantics/acceptedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/160667https://doi.org/10.1016/j.apsusc.2019.02.206reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésApplied Surface Science, 480, 115-121.201560E055MAT2016- 79866-RTEC2017-82464-RMAT2015-69035- REDChttps://www.sciencedirect.com/science/article/pii/S0169433219305574info:eu-repo/semantics/openAccessoai:idus.us.es:11441/1606672026-06-17T12:51:07Z
dc.title.none.fl_str_mv 2D compositional self-patterning in magnetron sputtered thin films
title 2D compositional self-patterning in magnetron sputtered thin films
spellingShingle 2D compositional self-patterning in magnetron sputtered thin films
García Valenzuela, Aurelio
Angle resolved XPS
Compositional patterning
LIPPS
Magnetron sputtering
SiOx thin films
Surface composition
title_short 2D compositional self-patterning in magnetron sputtered thin films
title_full 2D compositional self-patterning in magnetron sputtered thin films
title_fullStr 2D compositional self-patterning in magnetron sputtered thin films
title_full_unstemmed 2D compositional self-patterning in magnetron sputtered thin films
title_sort 2D compositional self-patterning in magnetron sputtered thin films
dc.creator.none.fl_str_mv García Valenzuela, Aurelio
Álvarez Molina, Rafael
Rico, Víctor
Espinós Manzano, Juan Pedro
López Santos, Carmen
Solís, Javier
Siegel, Jan
Campo, Adolfo del
Palmero Acebedo, Alberto
Rodríguez González-Elipe, Agustín
author García Valenzuela, Aurelio
author_facet García Valenzuela, Aurelio
Álvarez Molina, Rafael
Rico, Víctor
Espinós Manzano, Juan Pedro
López Santos, Carmen
Solís, Javier
Siegel, Jan
Campo, Adolfo del
Palmero Acebedo, Alberto
Rodríguez González-Elipe, Agustín
author_role author
author2 Álvarez Molina, Rafael
Rico, Víctor
Espinós Manzano, Juan Pedro
López Santos, Carmen
Solís, Javier
Siegel, Jan
Campo, Adolfo del
Palmero Acebedo, Alberto
Rodríguez González-Elipe, Agustín
author2_role author
author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Física Aplicada I
European Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER)
Ministerio de Economia, Industria y Competitividad (MINEICO). España
Universidad de Sevilla
dc.subject.none.fl_str_mv Angle resolved XPS
Compositional patterning
LIPPS
Magnetron sputtering
SiOx thin films
Surface composition
topic Angle resolved XPS
Compositional patterning
LIPPS
Magnetron sputtering
SiOx thin films
Surface composition
description Unlike topography patterning, widely used for numerous applications and produced by means of different technologies, there are no simple procedures to achieve surface compositional patterning at nanometric scales. In this work we have developed a simple method for 2D patterning the composition of thin films. The method relies on the magnetron sputtering deposition at oblique angles onto patterned substrates made by laser induced periodic surface structures (LIPSS). The method feasibility has been demonstrated by depositing SiOx thin films onto LIPSS structures generated in Cr layers. A heterogeneous and aligned distribution of O/Si ratios (and different Si n+ chemical states) along the LIPSS structure in length scales of some hundreds nm's has been proven by angle resolved X-ray photoelectron spectroscopy and a patterned arrangement of composition monitored by atomic force microscopy-Raman analysis. The obtained results are explained by the predictions of a Monte Carlo simulation of this deposition process and open the way for the tailored one-step fabrication of surface devices with patterned compositions.
publishDate 2019
dc.date.none.fl_str_mv 2019
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/acceptedVersion
format article
status_str acceptedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/11441/160667
https://doi.org/10.1016/j.apsusc.2019.02.206
url https://hdl.handle.net/11441/160667
https://doi.org/10.1016/j.apsusc.2019.02.206
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Applied Surface Science, 480, 115-121.
201560E055
MAT2016- 79866-R
TEC2017-82464-R
MAT2015-69035- REDC
https://www.sciencedirect.com/science/article/pii/S0169433219305574
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier B.V.
publisher.none.fl_str_mv Elsevier B.V.
dc.source.none.fl_str_mv reponame:idUS. Depósito de Investigación de la Universidad de Sevilla
instname:Universidad de Sevilla (US)
instname_str Universidad de Sevilla (US)
reponame_str idUS. Depósito de Investigación de la Universidad de Sevilla
collection idUS. Depósito de Investigación de la Universidad de Sevilla
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15,812429

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