Facile integration of ordered nanowires in functional devices

The integration of one-dimensional (1D) nanostructures of non-industry-standard semiconductors infunctional devices following bottom-up approaches is still an open challenge that hampers the exploita-tion of all their potential. Here, we present a simple approach to integrate metal oxide nanowires i...

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Detalles Bibliográficos
Autores: Guilera Sala, Jordi, Fàbrega Gallego, Cristian, Casals Guillén, Olga, Hernández Ramírez, Francisco, Wang, Shuangzhou, Mathur, Sanjay, Udrea, Florian, De Luca, Andrea, Ali, Syed Zeeshan, Romano Rodríguez, Albert, Prades García, Juan Daniel, Morante i Lleonart, Joan Ramon
Tipo de recurso: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2015
País:España
Institución:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Repositorio:Recercat. Dipósit de la Recerca de Catalunya
OAI Identifier:oai:recercat.cat:2445/97600
Acceso en línea:https://hdl.handle.net/2445/97600
Access Level:acceso abierto
Palabra clave:Elèctrodes
Nanoestructures
Nanotecnologia
Electrodes
Nanostructures
Nanotechnology
Descripción
Sumario:The integration of one-dimensional (1D) nanostructures of non-industry-standard semiconductors infunctional devices following bottom-up approaches is still an open challenge that hampers the exploita-tion of all their potential. Here, we present a simple approach to integrate metal oxide nanowires inelectronic devices based on controlled dielectrophoretic positioning together with proof of conceptdevices that corroborate their functionality. The method is flexible enough to manipulate nanowiresof different sizes and compositions exclusively using macroscopic solution-based techniques in conven-tional electrode designs. Our results show that fully functional devices, which display all the advantagesof single-nanowire gas sensors, photodetectors, and even field-effect transistors, are thus obtained rightafter a direct assembly step without subsequent metallization processing. This paves the way to lowcost, high throughput manufacturing of general-purpose electronic devices based on non-conventionaland high quality 1D nanostructures driving up many options for high performance and new low energyconsumption devices.