Micro/nanomechanical resonators for distributed mass sensing with capacitive detection
Micro/nanomechanical resonators have been designed and fabricated with the aim to be used as distributed mass sensors for in situ measurement of the thickness of ultra-thin layers. First, we present a comparative study of three kinds of oscillating devices (cantilever, bridge and quad beam). The qua...
| Autores: | , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2006 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/343498 |
| Acceso en línea: | http://hdl.handle.net/10261/343498 https://api.elsevier.com/content/abstract/scopus_id/33646028806 |
| Access Level: | acceso abierto |
| Palabra clave: | Capacitive detection | Distributed mass sensing | Monolithic integration | Nano-micromechanical resonators |
| Sumario: | Micro/nanomechanical resonators have been designed and fabricated with the aim to be used as distributed mass sensors for in situ measurement of the thickness of ultra-thin layers. First, we present a comparative study of three kinds of oscillating devices (cantilever, bridge and quad beam). The quad beam design has been selected for fabrication because it combines high sensitivity and good electrical response. The complete fabrication process of the device is based on electron beam lithography, lift-off and reactive ion etching. The frequency response has been characterized by means of electrical excitation and capacitive read-out. © 2006 Elsevier B.V. All rights reserved. |
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