Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media

Producción Científica

Detalles Bibliográficos
Autores: Kahro, Tauno, Tarre, Aivar, Käämbre, Tanel, Piirsoo, Helle-Mai, Kozlova, Jekaterina, Ritslaid, Peeter, Kasikov, Aarne, Jõgiaas, Taivo, Vinuesa Sanz, Guillermo, Dueñas Carazo, Salvador, Castán Lanaspa, María Helena, Tamm, Aile, Kukli, Kaupo
Tipo de recurso: artículo
Estado:Versión aceptada para publicación
Fecha de publicación:2021
País:España
Institución:Universidad de Valladolid
Repositorio:UVaDOC. Repositorio Documental de la Universidad de Valladolid
OAI Identifier:oai:uvadoc.uva.es:10324/46600
Acceso en línea:https://doi.org/10.1021/acsanm.1c00587
http://uvadoc.uva.es/handle/10324/46600
Access Level:acceso abierto
Palabra clave:Graphene
Grafeno
Atomic layer deposition
Deposición atómica de capas
Hafnium oxide
Óxido de hafnio
Stacked nanostructures
Nanoestructuras apiladas
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spelling Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching mediaKahro, TaunoTarre, AivarKäämbre, TanelPiirsoo, Helle-MaiKozlova, JekaterinaRitslaid, PeeterKasikov, AarneJõgiaas, TaivoVinuesa Sanz, GuillermoDueñas Carazo, SalvadorCastán Lanaspa, María HelenaTamm, AileKukli, KaupoGrapheneGrafenoAtomic layer depositionDeposición atómica de capasHafnium oxideÓxido de hafnioStacked nanostructuresNanoestructuras apiladasProducción CientíficaThin HfO2 films were grown by atomic layer deposition on chemical vapor-deposited large-area graphene. The graphene was transferred, prior to the deposition of the HfO2 overlayer, to the HfO2 bottom dielectric layer pregrown on the Si/TiN substrate. Either HfCl4 or Hf[N(CH3)(C2H5)]4 was used as the metal precursor for the bottom layer. The O2 plasma-assisted process was applied for growing HfO2 from Hf[N(CH3)(C2H5)]4 also on the top of graphene. To improve graphene transfer, the effects of the surface pretreatments of the as-grown and aged Si/TiN/HfO2 substrates were studied and compared. The graphene layer retained its integrity after the plasma processes. Studies on resistive switching on HfO2-graphene-HfO2 nanostructures revealed that the operational voltage ranges in the graphene-HfO2 stacks were modified together with the ratios between high- and low-resistance states.Fondo Europeo de Desarrollo Regional (projects TK134 and TK141)Ministerio de Economía, Industria y Competitividad (project TEC2017-84321-C4-2-R)Estonian Research Agency (projects PRG4 and PRG753)ACS Publications2021info:eu-repo/semantics/articleinfo:eu-repo/semantics/acceptedVersionapplication/pdfhttps://doi.org/10.1021/acsanm.1c00587http://uvadoc.uva.es/handle/10324/46600reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolidinstname:Universidad de ValladolidIngléshttps://pubs.acs.org/doi/10.1021/acsanm.1c00587info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-nd/4.0/oai:uvadoc.uva.es:10324/466002026-06-13T12:44:47Z
dc.title.none.fl_str_mv Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
title Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
spellingShingle Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
Kahro, Tauno
Graphene
Grafeno
Atomic layer deposition
Deposición atómica de capas
Hafnium oxide
Óxido de hafnio
Stacked nanostructures
Nanoestructuras apiladas
title_short Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
title_full Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
title_fullStr Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
title_full_unstemmed Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
title_sort Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
dc.creator.none.fl_str_mv Kahro, Tauno
Tarre, Aivar
Käämbre, Tanel
Piirsoo, Helle-Mai
Kozlova, Jekaterina
Ritslaid, Peeter
Kasikov, Aarne
Jõgiaas, Taivo
Vinuesa Sanz, Guillermo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author Kahro, Tauno
author_facet Kahro, Tauno
Tarre, Aivar
Käämbre, Tanel
Piirsoo, Helle-Mai
Kozlova, Jekaterina
Ritslaid, Peeter
Kasikov, Aarne
Jõgiaas, Taivo
Vinuesa Sanz, Guillermo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author_role author
author2 Tarre, Aivar
Käämbre, Tanel
Piirsoo, Helle-Mai
Kozlova, Jekaterina
Ritslaid, Peeter
Kasikov, Aarne
Jõgiaas, Taivo
Vinuesa Sanz, Guillermo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
author2_role author
author
author
author
author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Graphene
Grafeno
Atomic layer deposition
Deposición atómica de capas
Hafnium oxide
Óxido de hafnio
Stacked nanostructures
Nanoestructuras apiladas
topic Graphene
Grafeno
Atomic layer deposition
Deposición atómica de capas
Hafnium oxide
Óxido de hafnio
Stacked nanostructures
Nanoestructuras apiladas
description Producción Científica
publishDate 2021
dc.date.none.fl_str_mv 2021
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/acceptedVersion
format article
status_str acceptedVersion
dc.identifier.none.fl_str_mv https://doi.org/10.1021/acsanm.1c00587
http://uvadoc.uva.es/handle/10324/46600
url https://doi.org/10.1021/acsanm.1c00587
http://uvadoc.uva.es/handle/10324/46600
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv https://pubs.acs.org/doi/10.1021/acsanm.1c00587
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-nd/4.0/
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by-nc-nd/4.0/
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv ACS Publications
publisher.none.fl_str_mv ACS Publications
dc.source.none.fl_str_mv reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname:Universidad de Valladolid
instname_str Universidad de Valladolid
reponame_str UVaDOC. Repositorio Documental de la Universidad de Valladolid
collection UVaDOC. Repositorio Documental de la Universidad de Valladolid
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15,300724

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