Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures

Multiple layers of graphene thin films with micro-crystalline orientation and vertical graphene nano-sheets were grown on different substrates (i.e., polycrystalline nickel foil, Ni(111), highly oriented pyrolytic graphite) using a single-step process based on low-pressure remote Plasma-Enhanced Che...

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Autores: González Cuxart, Marc|||0000-0002-9085-1225, Šics, Igors, Goñi, Alejandro|||0000-0002-1193-3063, Pach, Elzbieta|||0000-0001-9587-3768, Sauthier, Guillaume|||0000-0003-3566-3878, Paradinas, Markos|||0000-0003-1006-9506, Foerster, Michael|||0000-0002-4147-6668, Aballe, Lucía|||0000-0003-1810-8768, Moreno Fernández, Harol Aníbal|||0000-0002-4362-9488, Carlino, Vincent, Pellegrin, Eric|||0000-0002-1648-0331
Tipo de recurso: artículo
Fecha de publicación:2017
País:España
Institución:Universitat Autònoma de Barcelona
Repositorio:Dipòsit Digital de Documents de la UAB
Idioma:inglés
OAI Identifier:oai:ddd.uab.cat:225310
Acceso en línea:https://ddd.uab.cat/record/225310
https://dx.doi.org/urn:doi:10.1016/j.carbon.2017.02.067
Access Level:acceso abierto
Palabra clave:Chemical vapor depositions (CVD)
Crystalline orientations
Highly oriented pyrolytic graphite
Inductively coupled RF plasma
Micro and nanostructures
Orientational effects
Polycrystalline nickels
Remote plasma enhanced chemical vapor depositions
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spelling Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructuresGonzález Cuxart, Marc|||0000-0002-9085-1225Šics, IgorsGoñi, Alejandro|||0000-0002-1193-3063Pach, Elzbieta|||0000-0001-9587-3768Sauthier, Guillaume|||0000-0003-3566-3878Paradinas, Markos|||0000-0003-1006-9506Foerster, Michael|||0000-0002-4147-6668Aballe, Lucía|||0000-0003-1810-8768Moreno Fernández, Harol Aníbal|||0000-0002-4362-9488Carlino, VincentPellegrin, Eric|||0000-0002-1648-0331Chemical vapor depositions (CVD)Crystalline orientationsHighly oriented pyrolytic graphiteInductively coupled RF plasmaMicro and nanostructuresOrientational effectsPolycrystalline nickelsRemote plasma enhanced chemical vapor depositionsMultiple layers of graphene thin films with micro-crystalline orientation and vertical graphene nano-sheets were grown on different substrates (i.e., polycrystalline nickel foil, Ni(111), highly oriented pyrolytic graphite) using a single-step process based on low-pressure remote Plasma-Enhanced Chemical Vapor Deposition (rPE-CVD). In contrast to previous studies, a novel basic approach to this technique including a new remote inductively coupled RF plasma source has been used to (i) minimize the orientational effect of the plasma electrical fields during the catalyst-free growth of graphene nano-sheets, (ii) warrant for a low graphene defect density via low plasma kinetics, (iii) decouple the dissociation process of the gas from the growth process of graphene on the substrate, (iv) tune the feedstock gas chemistry in view of improving the graphene growth, and (v) reduce the growth temperature as compared to conventional chemical vapor deposition (CVD). In order to study the various aspects of the rPE-CVD graphene growth modes and to assess the characteristics of the resulting graphene layers, Raman spectroscopy, XPS, SEM, and STM were used. The results give evidence for the successful performance of this new rPE-CVD plasma deposition source, that can be combined with in situ UHV-based processess for the production of, e. g., hybrid metal ferromagnet/graphene systems. 22017-01-0120172017-01-01Articlehttp://purl.org/coar/resource_type/c_6501AMhttp://purl.org/coar/version/c_ab4af688f83e57aainfo:eu-repo/semantics/articleapplication/pdfhttps://ddd.uab.cat/record/225310https://dx.doi.org/urn:doi:10.1016/j.carbon.2017.02.067reponame:Dipòsit Digital de Documents de la UABinstname:Universitat Autònoma de BarcelonaInglésengMinisterio de Economía y Competitividad https://doi.org/10.13039/501100003329 CSD2010-00044Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2015-0496Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295open accesshttp://purl.org/coar/access_right/c_abf2Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, i la comunicació pública de l'obra, sempre que no sigui amb finalitats comercials, i sempre que es reconegui l'autoria de l'obra original. No es permet la creació d'obres derivades.https://creativecommons.org/licenses/by-nc-nd/4.0/info:eu-repo/semantics/openAccessoai:ddd.uab.cat:2253102026-06-06T12:50:31Z
dc.title.none.fl_str_mv Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
title Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
spellingShingle Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
González Cuxart, Marc|||0000-0002-9085-1225
Chemical vapor depositions (CVD)
Crystalline orientations
Highly oriented pyrolytic graphite
Inductively coupled RF plasma
Micro and nanostructures
Orientational effects
Polycrystalline nickels
Remote plasma enhanced chemical vapor depositions
title_short Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
title_full Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
title_fullStr Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
title_full_unstemmed Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
title_sort Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
dc.creator.none.fl_str_mv González Cuxart, Marc|||0000-0002-9085-1225
Šics, Igors
Goñi, Alejandro|||0000-0002-1193-3063
Pach, Elzbieta|||0000-0001-9587-3768
Sauthier, Guillaume|||0000-0003-3566-3878
Paradinas, Markos|||0000-0003-1006-9506
Foerster, Michael|||0000-0002-4147-6668
Aballe, Lucía|||0000-0003-1810-8768
Moreno Fernández, Harol Aníbal|||0000-0002-4362-9488
Carlino, Vincent
Pellegrin, Eric|||0000-0002-1648-0331
author González Cuxart, Marc|||0000-0002-9085-1225
author_facet González Cuxart, Marc|||0000-0002-9085-1225
Šics, Igors
Goñi, Alejandro|||0000-0002-1193-3063
Pach, Elzbieta|||0000-0001-9587-3768
Sauthier, Guillaume|||0000-0003-3566-3878
Paradinas, Markos|||0000-0003-1006-9506
Foerster, Michael|||0000-0002-4147-6668
Aballe, Lucía|||0000-0003-1810-8768
Moreno Fernández, Harol Aníbal|||0000-0002-4362-9488
Carlino, Vincent
Pellegrin, Eric|||0000-0002-1648-0331
author_role author
author2 Šics, Igors
Goñi, Alejandro|||0000-0002-1193-3063
Pach, Elzbieta|||0000-0001-9587-3768
Sauthier, Guillaume|||0000-0003-3566-3878
Paradinas, Markos|||0000-0003-1006-9506
Foerster, Michael|||0000-0002-4147-6668
Aballe, Lucía|||0000-0003-1810-8768
Moreno Fernández, Harol Aníbal|||0000-0002-4362-9488
Carlino, Vincent
Pellegrin, Eric|||0000-0002-1648-0331
author2_role author
author
author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Chemical vapor depositions (CVD)
Crystalline orientations
Highly oriented pyrolytic graphite
Inductively coupled RF plasma
Micro and nanostructures
Orientational effects
Polycrystalline nickels
Remote plasma enhanced chemical vapor depositions
topic Chemical vapor depositions (CVD)
Crystalline orientations
Highly oriented pyrolytic graphite
Inductively coupled RF plasma
Micro and nanostructures
Orientational effects
Polycrystalline nickels
Remote plasma enhanced chemical vapor depositions
description Multiple layers of graphene thin films with micro-crystalline orientation and vertical graphene nano-sheets were grown on different substrates (i.e., polycrystalline nickel foil, Ni(111), highly oriented pyrolytic graphite) using a single-step process based on low-pressure remote Plasma-Enhanced Chemical Vapor Deposition (rPE-CVD). In contrast to previous studies, a novel basic approach to this technique including a new remote inductively coupled RF plasma source has been used to (i) minimize the orientational effect of the plasma electrical fields during the catalyst-free growth of graphene nano-sheets, (ii) warrant for a low graphene defect density via low plasma kinetics, (iii) decouple the dissociation process of the gas from the growth process of graphene on the substrate, (iv) tune the feedstock gas chemistry in view of improving the graphene growth, and (v) reduce the growth temperature as compared to conventional chemical vapor deposition (CVD). In order to study the various aspects of the rPE-CVD graphene growth modes and to assess the characteristics of the resulting graphene layers, Raman spectroscopy, XPS, SEM, and STM were used. The results give evidence for the successful performance of this new rPE-CVD plasma deposition source, that can be combined with in situ UHV-based processess for the production of, e. g., hybrid metal ferromagnet/graphene systems.
publishDate 2017
dc.date.none.fl_str_mv 2
2017-01-01
2017
2017-01-01
dc.type.none.fl_str_mv Article
http://purl.org/coar/resource_type/c_6501
AM
http://purl.org/coar/version/c_ab4af688f83e57aa
dc.type.openaire.fl_str_mv info:eu-repo/semantics/article
format article
dc.identifier.none.fl_str_mv https://ddd.uab.cat/record/225310
https://dx.doi.org/urn:doi:10.1016/j.carbon.2017.02.067
url https://ddd.uab.cat/record/225310
https://dx.doi.org/urn:doi:10.1016/j.carbon.2017.02.067
dc.language.none.fl_str_mv Inglés
eng
language_invalid_str_mv Inglés
language eng
dc.relation.none.fl_str_mv Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 CSD2010-00044
Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2015-0496
Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295
dc.rights.none.fl_str_mv open access
http://purl.org/coar/access_right/c_abf2
https://creativecommons.org/licenses/by-nc-nd/4.0/
dc.rights.openaire.fl_str_mv info:eu-repo/semantics/openAccess
rights_invalid_str_mv open access
http://purl.org/coar/access_right/c_abf2
https://creativecommons.org/licenses/by-nc-nd/4.0/
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Dipòsit Digital de Documents de la UAB
instname:Universitat Autònoma de Barcelona
instname_str Universitat Autònoma de Barcelona
reponame_str Dipòsit Digital de Documents de la UAB
collection Dipòsit Digital de Documents de la UAB
repository.name.fl_str_mv
repository.mail.fl_str_mv
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