Aerosol-assisted CVD of SnO<inf>2</inf> thin films for gas-sensor applications
In this article is a report of SnO2 deposition by aerosol-assisted (AA)CVD from tin complexes, [Sn(18-Cr-6)Cl4] and [Sn(H2O)2Cl4](18-Cr-6). The structure and properties of the precursors, used to synthesize SnO2 layers by AACVD for the first time, are characterized with the help of X-ray diffraction...
| Autores: | , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2011 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/345535 |
| Acceso en línea: | http://hdl.handle.net/10261/345535 https://api.elsevier.com/content/abstract/scopus_id/80053204639 |
| Access Level: | acceso abierto |
| Palabra clave: | AACVD | Gas sensors | Metal oxide | SnO 2 |
| Sumario: | In this article is a report of SnO2 deposition by aerosol-assisted (AA)CVD from tin complexes, [Sn(18-Cr-6)Cl4] and [Sn(H2O)2Cl4](18-Cr-6). The structure and properties of the precursors, used to synthesize SnO2 layers by AACVD for the first time, are characterized with the help of X-ray diffraction (XRD), infrared (IR), and thermogravimetric analysis (TGA). Each complex is deposited by AACVD at 250, 400, and 500°C in a flow of N2. The resulting films are studied by XRD and atomic force microscopy (AFM). Gas-sensing properties of the deposited layers are tested to 10ppm NO2 in air. The maximum sensor response to the analyte is measured at 300°C. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. |
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