Nanostructured MnGa films on Si/SiO2 with 20.5 kOe room temperature coercivity
Nanostructured Mn67Ga33 films exhibiting high room temperature coercivity (HC 20.5 kOe) have been prepared by sputtering onto thermally oxidized Si substrates. Both the morphology and the coercivity of the films can be tuned by varying the growth parameters. The low deposition rate film, sputtered a...
| Autores: | , , , |
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| Tipo de documento: | artigo |
| Data de publicação: | 2011 |
| País: | España |
| Recursos: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositório: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/51053 |
| Acesso em linha: | http://hdl.handle.net/10261/51053 |
| Access Level: | Acceso aberto |
| Resumo: | Nanostructured Mn67Ga33 films exhibiting high room temperature coercivity (HC 20.5 kOe) have been prepared by sputtering onto thermally oxidized Si substrates. Both the morphology and the coercivity of the films can be tuned by varying the growth parameters. The low deposition rate film, sputtered at a reduced power and working pressure, demonstrates a discontinuous island-like growth and the highest HC. The large H C is linked to the presence of the high anisotropy DO22 Mn3Ga phase and the single domain character of the exchange isolated, dipolar interacting, single crystal islands. © 2011 American Institute of Physics. |
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