Structure of TiAlN reactive sputtered coatings
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-fre...
| Autores: | , , , , , , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2012 |
| País: | España |
| Institución: | Universidad de Sevilla (US) |
| Repositorio: | idUS. Depósito de Investigación de la Universidad de Sevilla |
| OAI Identifier: | oai:idus.us.es:11441/81584 |
| Acceso en línea: | https://hdl.handle.net/11441/81584 |
| Access Level: | acceso abierto |
| Palabra clave: | Coating Hardness Reactive Sputtering TiAlN X-Ray Diffraction Raman Spectroscopy |
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Structure of TiAlN reactive sputtered coatingsDenisov, V.N.Mavrin, B.B.Vinogradov, E.A.Polyakov, S.N.Kiricjenko, A.N.Gogolinsky, K.V.Useinov, A.S.Blank, V.D.Fortio Godinho, Vanda CristinaPhilippon, D.Fernández Camacho, AsunciónCoatingHardnessReactive SputteringTiAlNX-Ray DiffractionRaman SpectroscopyThe Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm -1 or in the region of 830 - 850 cm -1 depending on the deposition parameters whereas it is not exceed 630 cm -1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiN x] with x = 5 and x = 4. The chains of polyhedra [TiN x] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N 2 gas.Sumy State University2012info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/81584reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésJournal of Nano- and Electronic Physics, 4, 01021-1-4.info:eu-repo/semantics/openAccessoai:idus.us.es:11441/815842026-06-17T12:51:07Z |
| dc.title.none.fl_str_mv |
Structure of TiAlN reactive sputtered coatings |
| title |
Structure of TiAlN reactive sputtered coatings |
| spellingShingle |
Structure of TiAlN reactive sputtered coatings Denisov, V.N. Coating Hardness Reactive Sputtering TiAlN X-Ray Diffraction Raman Spectroscopy |
| title_short |
Structure of TiAlN reactive sputtered coatings |
| title_full |
Structure of TiAlN reactive sputtered coatings |
| title_fullStr |
Structure of TiAlN reactive sputtered coatings |
| title_full_unstemmed |
Structure of TiAlN reactive sputtered coatings |
| title_sort |
Structure of TiAlN reactive sputtered coatings |
| dc.creator.none.fl_str_mv |
Denisov, V.N. Mavrin, B.B. Vinogradov, E.A. Polyakov, S.N. Kiricjenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Fortio Godinho, Vanda Cristina Philippon, D. Fernández Camacho, Asunción |
| author |
Denisov, V.N. |
| author_facet |
Denisov, V.N. Mavrin, B.B. Vinogradov, E.A. Polyakov, S.N. Kiricjenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Fortio Godinho, Vanda Cristina Philippon, D. Fernández Camacho, Asunción |
| author_role |
author |
| author2 |
Mavrin, B.B. Vinogradov, E.A. Polyakov, S.N. Kiricjenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Fortio Godinho, Vanda Cristina Philippon, D. Fernández Camacho, Asunción |
| author2_role |
author author author author author author author author author author |
| dc.subject.none.fl_str_mv |
Coating Hardness Reactive Sputtering TiAlN X-Ray Diffraction Raman Spectroscopy |
| topic |
Coating Hardness Reactive Sputtering TiAlN X-Ray Diffraction Raman Spectroscopy |
| description |
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm -1 or in the region of 830 - 850 cm -1 depending on the deposition parameters whereas it is not exceed 630 cm -1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiN x] with x = 5 and x = 4. The chains of polyhedra [TiN x] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N 2 gas. |
| publishDate |
2012 |
| dc.date.none.fl_str_mv |
2012 |
| dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |
| format |
article |
| status_str |
publishedVersion |
| dc.identifier.none.fl_str_mv |
https://hdl.handle.net/11441/81584 |
| url |
https://hdl.handle.net/11441/81584 |
| dc.language.none.fl_str_mv |
Inglés |
| language_invalid_str_mv |
Inglés |
| dc.relation.none.fl_str_mv |
Journal of Nano- and Electronic Physics, 4, 01021-1-4. |
| dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess |
| eu_rights_str_mv |
openAccess |
| dc.format.none.fl_str_mv |
application/pdf application/pdf |
| dc.publisher.none.fl_str_mv |
Sumy State University |
| publisher.none.fl_str_mv |
Sumy State University |
| dc.source.none.fl_str_mv |
reponame:idUS. Depósito de Investigación de la Universidad de Sevilla instname:Universidad de Sevilla (US) |
| instname_str |
Universidad de Sevilla (US) |
| reponame_str |
idUS. Depósito de Investigación de la Universidad de Sevilla |
| collection |
idUS. Depósito de Investigación de la Universidad de Sevilla |
| repository.name.fl_str_mv |
|
| repository.mail.fl_str_mv |
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| _version_ |
1869406929384636416 |
| score |
15,300719 |